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首页> 外文会议>Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS VI; Proceedings of SPIE-The International Society for Optical Engineering; vol.6463 >Optical MEMS: Designing for reliability
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Optical MEMS: Designing for reliability

机译：光学MEMS：可靠性设计

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The inter-disciplinary nature of MEMS makes its design a highly involved process. In Optical MEMS the addition of optical parameters only increases the complexity. It is almost impossible for a designer to know where to start given the number of variables involved. In order to design a device that will meet the required specifications over its entire lifetime, reliability issues must be included in the design process. This paper develops a method that can be used to create a step-by-step design process involving reliability issues at every stage. The process begins by listing out the constants and constraints of the design. The constraints could be due to physical parameters, MEMS fabrication processes, optical reasons, reliability issues, etc. They affect the design in different ways; for example, two fibres cannot be brought closer than 250μm. This constraint will affect the optical design and the overall dimensions of the device. Taking all such constraints into account, an optical design process is outlined. The effect of individual errors is studied on a key parameter like insertion loss. This gives the designer information about which parameters the design is more sensitive to and will help in deciding the manufacturing tolerances required in the different stages. Using all of this data, an "ideal design" is developed. A Monte Carlo analysis is carried out on that design to show the effect of errors occurring simultaneously. The paper concludes with a flow chart of a suggested design process to be used when designing optical MEMS devices.
机译：MEMS的跨学科性质使其设计成为高度参与的过程。在光学MEMS中，增加光学参数只会增加复杂度。考虑到所涉及的变量数量，设计人员几乎不可能知道从哪里开始。为了设计一种在整个使用寿命内都符合要求规格的设备，必须在设计过程中考虑可靠性问题。本文开发了一种方法，可用于创建在每个阶段都涉及可靠性问题的分步设计过程。该过程首先列出设计的常数和约束。这些限制可能是由于物理参数，MEMS制造工艺，光学原因，可靠性问题等引起的。它们以不同的方式影响设计；例如，例如，两条光纤的距离不能超过250μm。该约束将影响光学设计和设备的整体尺寸。考虑到所有这些限制，概述了光学设计过程。研究了单个错误对诸如插入损耗之类的关键参数的影响。这为设计人员提供了有关设计对哪些参数更敏感的信息，并将有助于确定不同阶段所需的制造公差。利用所有这些数据，开发了“理想设计”。在该设计上进行了蒙特卡洛分析，以显示同时发生的错误的影响。本文以设计光学MEMS器件时使用的建议设计过程的流程图结束。

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