Reductive photopatterning of phenylene-vinylene-based polymers

机译：苯乙炔基聚合物的还原光图案化

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Photochemical methods were developed to obtain a variation of the refractive index in aromatic polymer surfaces and a change in the photoluminescence characteristics of phenylene-vinylene-based polymers. Films of aromatic polymers, among them polystyrene (PS), poly(2-vinylnaphthalene) (PVN) and derivatives of poly(p-phenylene-vinylene) (PPV) were UV irradiated in the presence of gaseous hydrazine (N_2H_4). The photoreaction led to a strong reduction of the refractive index of the polymers due to a hydrogenation of the aromatic units. In the case of PPV, we observed reductive photobleaching. This new technique was employed to produce photogenerated patterns in PPV. The results are compared to oxidative bleaching.

机译：开发了光化学方法以获得在芳族聚合物表面中的折射率的变化和亚苯基-亚乙烯基聚合物的光致发光特性的变化。在气态肼（N_2H_4）的存在下，对芳香族聚合物的薄膜进行紫外线照射，其中包括聚苯乙烯（PS），聚（2-乙烯基萘）（PVN）和聚（对亚苯基亚乙烯基）（PPV）衍生物。由于芳族单元的氢化，光反应导致聚合物的折射率大大降低。在PPV的情况下，我们观察到还原性光漂白。这项新技术被用来在PPV中产生光生图案。将结果与氧化漂白进行比较。

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《Self-Assembly Processes in Materials》|2001年|p.55-60|共6页
会议地点 Boston MA(US);Boston MA(US)
作者
T. Kavc; G. Langer; W. Kern; A. Ruplitsch; K. Mahler; F. Stelzer; G. Hayn; R. Saf; E.J.W. List; E. Zojer; M. T. Ahmed; A. Pogantsch; K.F. Iskra; T. Neger; H.-H. Hoerhold; H. Tillmann; G. Kranzelbinder; E. Toussaere; G. Jakopic;
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Institute for Chemistry and Technology of Organic Materials, Graz University of Technology, Graz, Austria;

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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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4. Reductive photopatterning of phenylene-vinylene-based polymers [C] . T.Kavc, G.Langer, W.Kern, Materials Research Society Symposium . 2002

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Reductive photopatterning of phenylene-vinylene-based polymers

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