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ELECTROCHEMICAL CHARACTERIZATION OF NITROGEN INCORPORATED TETRAHEDRAL CARBON FILMS GROWN BY A FILTERED CATHODIC VACUUM ARC

机译:阴极阴极真空电弧生长的氮结合四面体碳膜的电化学表征

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摘要

Tetrahedral carbon films incorporating nitrogen (taC:N) have been produced on Si, Ta, Ti and electrochemically roughened Ag surfaces using a single commercial filtered cathodic vacuum arc (FCVA) carbon ion source in the presence of nitrogen gas at reduced pressure. Highly resolved Raman spectra under visible laser excitation were obtained for taC:N films only a few nm thick deposited on roughened Ag, including the rather elusive T band characteristic of sp3 hybridized bonding. The electrochemical response of taC:N supported on polished Ta in aqueous solutions was found to be virtually identical to that reported earlier for taC:N films on Si prepared by the simultaneous incidence of a custom made FCVA carbon ion source and a nitrogen ion gun. Reversible kinetics for Ru(NH_3)_6Cl_3 reduction in 1M KC1 and electrocatalytic activity for chlorine evolution and reduction in 1 M HC1 solutions are observed juxtaposed to high overpotentials for hydrogen and oxygen evolution.
机译:含氮(taC:N)的四面体碳膜已在氮气,减压下使用单个商用过滤阴极真空电弧(FCVA)碳离子源在Si,Ta,Ti和电化学粗糙化的Ag表面上制成。对于仅几纳米厚的taC:N薄膜,在粗糙的Ag上沉积,可获得可见激光激发下的高分辨拉曼光谱,其中包括sp3杂化键的相当难以捉摸的T带特征。发现在抛光的水溶液中负载在抛光Ta上的taC:N的电化学响应与先前报道的同时通过定制FCVA碳离子源和氮离子枪同时入射制备的Si上taC:N膜的电化学响应基本相同。观察到Ru(NH_3)_6Cl_3在1M KC1中还原的可逆动力学以及在氯的释放和在1 M HCl溶液中的还原的电催化活性与氢气和氧气的高过电位并列。

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