PREPARATION OF BORON-DOPED DIAMOND THIN FILMS USING BF_3 AND THE ELECTROCHEMICAL BEHAVIOR OF THE SEMICONDUCTING DIAMOND ELECTRODES

机译：利用BF_3制备掺硼金刚石薄膜及半导电金刚石电极的电化学行为

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Boron-doped diamond thin films were prepared using BF_3 by microwave plasma assisted chemical vapor deposition, and the electrochemical behavior of the semiconducting diamond electrodes was investigated.

机译：利用微波等离子体辅助化学气相沉积法，通过BF_3制备了掺硼金刚石薄膜，研究了半导体金刚石电极的电化学行为。

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《The Seventh International Symposium on Diamond Materials was Held at the 200th Meeting of the Electrochemical Society, Jointly with the 52nd Meeting of the International Society of Electrochemistry, Sep 2-7, 2001, San Francisco, California》|2001年|p.103-107|共5页
会议地点 San Francisco CA(US);San Francisco CA(US);San Francisco CA(US)
作者
Fujio Okino; Yukio Kawaguchi; Shinji Kawasaki; Hidekazu Touhara; Mikka Nishitani-Gamo; Toshihiro Ando;
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Faculty of Textile Science and Technology, Shinshu University 3-15-1 Tokida, Ueda 386-8567, Japan;

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原文格式 PDF
正文语种 eng
中图分类化学;
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专利

1. Preparation of boron-doped semiconducting diamond films using BF_3 and the electrochemical behavior of the semiconducting diamond electrodes [J] . Fujio Okino, Yukio Kawaguchi, Hidekazu Touhara, Journal of Fluorine Chemistry . 2004,第11期

机译：BF_3制备掺硼半导体金刚石薄膜及半导体金刚石电极的电化学行为
2. Standard electrochemical behavior of high-quality, boron-doped polycrystalline diamond thin-film electrodes [J] . Michael C. Granger, Malgorzata Witek, Jishou Xu Analytical chemistry . 2000,第16期

机译：高质量硼掺杂多晶金刚石薄膜电极的标准电化学行为
3. Standard Electrochemical Behavior of High-Quality, Boron-Doped Polycrystalline Diamond Thin-Film Electrodes [J] . Michael C. Cranger, Malgorzata Witek, Jishou Xu, Analytical chemistry . 2000,第16期

机译：高质量，掺硼多晶金刚石薄膜电极的标准电化学行为
4. Preparation of boron-doped diamond thin films using BF_3 and the electrochemical behavior of the semiconducting diamond electrodes [C] . Fujio Okino, Yukio Kawaguchi, Shinji Kawasaki, International symposium on Diamond Materials . 2002

机译：使用BF_3制备硼掺杂的金刚石薄膜和半导体金刚石电极的电化学行为
5. The electrochemical oxidation and detection of ascorbic acid at hydrogen- and oxygen-terminated boron-doped diamond thin film electrodes. [D] . Hanks, Amy. 2006

机译：氢和氧封端的硼掺杂金刚石薄膜电极的抗坏血酸的电化学氧化和检测。
6. High-Temperature Oxidation of Heavy Boron-Doped Diamond Electrodes: Microstructural and Electrochemical Performance Modification [O] . Jacek Ryl, Mateusz Cieslik, Artur Zielinski, 2020

机译：重硼掺杂金刚石电极的高温氧化：微观结构和电化学性能的修改。
7. Anodic Behavior of Semiconducting Diamond Thin-film Electrodes in the Electrolyte for Electrochemical Fluorination [O] . Fujio Okino, Hirotake Shibata, Shinji Kawasaki, 1998

机译：电解质中半导体金刚石薄膜电极进行电化学氟化的阳极行为

PREPARATION OF BORON-DOPED DIAMOND THIN FILMS USING BF_3 AND THE ELECTROCHEMICAL BEHAVIOR OF THE SEMICONDUCTING DIAMOND ELECTRODES

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