Effects of OH on the structural relaxation in silica glass were investigated by observing the fictive temperature, which was determined from the position of infrared absorption peak around 2260 cm~(-1) related to the average Si-O-Si bond angle. It has been found that OH strongly reduces the relaxation time of the a-relaxation, while it slightly decreases its activation energy. Moreover, OH generates a sub-relaxational process. Its relaxation time decreases with increasing the OH concentration.
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