Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation

机译：强烈的EUV辐射导致Si和Ru覆盖的Mo / Si多层反射镜的反射率变化

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《Society of Photo-Optical Instrumentation Engineers (SPIE);SPIE Proceedings》|2005年|1077-1083|共7页
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Yukinobu Kakutani; Masahito Niibe; Hiromitsu Takase; Shigeru Terashima; Hiroyuki Kondo; Shuichi Matsunari; Takashi Aoki; Yoshio Gomei; Yasuaki Fukuda;
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Laboratory of Advanced Science and Technology for Industry (LASTI) University of Hyogo 3-1-2 Kouto Kamigori-cho Ako-gun Hyogo 678-1205 Japan yukinobu@lasti.u-hyogo.ac.jp phone +81 (0)791 58 1449 fax +81 (0)791 58 0242;

Laboratory of Advanced Science and Technology for Industry (LASTI) University of Hyogo 3-1-2 Kouto Kamigori-cho Ako-gun Hyogo 678-1205 Japan;

Extreme Ultraviolet Lithography System Development Association (EUVA) 5th Floor NishimotoKosanNishikicho Bldg. 3-23 Kanda Nishiki-cho Chiyoda-ku Tokyo 101-0054 Japan;

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专利

1. Toward the in situ remediation of carbon deposition on Ru-capped multilayer mirrors intended for EUV lithography: Exploiting the electron-induced chemistry [J] . Davis DJ, Kyriakou G, Grant RB, The journal of physical chemistry, C. Nanomaterials and interfaces . 2007,第33期

机译：旨在原位修复用于EUV光刻的Ru盖多层反射镜上的碳沉积：利用电子诱导化学
2. Detection of surface changes of materials caused by intense irradiation with laser-plasma EUV source utilizing scattered or luminescent radiation excited with the EUV pulses [J] . A. BARTNIK, H. FIEDOROWICZ, R. JAROCKI, Applied physics . 2008,第1期

机译：利用EUV脉冲激发的散射或发光辐射，检测激光等离子EUV源强烈辐照引起的材料表面变化
3. Atomic Hydrogen Cleaning of Surface Ru Oxide Formed by Extreme Ultraviolet Irradiation of Ru-Capped Multilayer Mirrors in H_2O Ambience [J] . Hiroaki OIZUMI, Akira IZUMI, Kumi MOTAI, Japanese journal of applied physics . 2007,第25a28期

机译：H_2O环境中Ru覆盖多层镜的极紫外辐射形成的表面Ru氧化物的原子氢清洗。
4. Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation [C] . Yukinobu Kakutani, Masahito Niibe, Hiromitsu Takase, Emerging Lithographic Technologies IX pt.2 . 2005

机译：强烈的EUV辐射导致Si和Ru覆盖的Mo / Si多层反射镜的反射率变化
5. Optical constants of materials in the EUV/soft x-ray region for multilayer mirror applications. [D] . Soufli, Regina. 1997

机译：用于多层反射镜的EUV /软X射线区域中材料的光学常数。
6. Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold [O] . Igor A. Makhotkin, Ryszard Sobierajski, Jaromir Chalupský, -1

机译：在单次损伤阈值以下的长期自由电子激光照射下EUV镜辐射损伤抵抗性的实验研究
7. In-band and out-of-band reflectance calibrations of the EUV multilayer mirrors of the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory [O] . Regina Soufli, Eberhard Spiller, David L. Windt, 2012

机译：大气成像组件仪的EUV多层镜的带内和带外反射校准，即在太阳能动力学天文台上
8. Critical Parameters Influencing the EUV-Induced Damage of Ru-Capped Multilayer Mirrors [R] . Hill, S. B. 2007

机译：关键参数影响EUV引起的Ru型多层反射镜损伤

Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation

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