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首页> 外文会议>Society of Vacuum Coaters Annual Technical Conference; 20040424-29; Dallas,TX(US) >Scale-up of Microwave Resonator Plasma Sources for Large Area
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Scale-up of Microwave Resonator Plasma Sources for Large Area

机译：大面积微波谐振器等离子体源的按比例放大

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摘要

A new scaling of microwave plasma sources will be presented. Plasma processes can be made more effective by decreasing the process time or increasing the size of equipment. Both leads to higher production quantities in a system. While increase of size is commonly used for multi-mode plasma and RF plasma processes, the increase of process speed was limited in the relation between pressure and spatial homogeneity of plasma. Furthermore, resonator based plasma sources have been limited in size according to their modes and the wavelength of excitation frequency. The concept of a cylindrical resonator with annular slots allows the increase of diameter and volume as well. The power coupling concept and a change of wavelength enables such modifications. In conjunction with high gas flows, which are possible at medium pressure operation, the sources show very high performance and fast processing speed due to larger amount of available active species in the plasma. The up-scaling of microwave plasma sources in medium pressure is essential for the technology transfer of diamond deposition into production processes. As an example the largest resonator based microwave plasma source (roughly 16" plasma chamber diameter) will be presented and further scaling ability will be explained.
机译：将提出微波等离子体源的新标度。通过减少处理时间或增加设备尺寸，可以使等离子体处理更加有效。两者都导致系统中更高的产量。尽管尺寸增加通常用于多模式等离子体和RF等离子体工艺，但是在压力和等离子体空间均匀性之间的关系上，工艺速度的提高受到限制。此外，基于谐振器的等离子体源已经根据其模式和激发频率的波长在尺寸上受到限制。具有环形槽的圆柱形谐振器的概念也允许直径和体积的增加。功率耦合的概念和波长的变化使这种修改成为可能。与在中等压力操作下可能产生的高气流相结合，由于等离子体中大量的可用活性物质，离子源显示出非常高的性能和快速的处理速度。在中等压力下扩大微波等离子体源对于将金刚石沉积技术转移到生产过程中至关重要。作为示例，将介绍最大的基于谐振器的微波等离子体源（大约16英寸的等离子体腔直径），并进一步说明缩放能力。

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