首页> 外文会议>Society of Vacuum Coaters Annual Technical Conference; 20070428-0503; Louisville,KY(US) >Using a Standard Penning Gauge as a Powerful Means of Monitoring and Feedback Control
【24h】

Using a Standard Penning Gauge as a Powerful Means of Monitoring and Feedback Control

机译:使用标准Penning量规作为监视和反馈控制的有力手段

获取原文
获取原文并翻译 | 示例

摘要

This paper introduces the concept of combining fast and slow feedback control with measured plasma properties in order to maintain a systems operation at optimum level with enhanced up-time and reduced energy costs. Plasma emission monitoring (PEM) for fast feedback control is typically used when maintaining areacti ve sputtering process in high rate transition mode. Slow feedback can be used to determine the state of the system and measure drifts in plasma properties with time and provide the appropriate corrections or operator warnings. The slow feedback is 'condition monitoring' and helps to predict maintenance cycles and failure of the plasma process. This results in products within the given specifications. In order to provide a more robust PEM response from the process an ex-situ method is illustrated that used the plasma within a typical Penning vacuum measurement gauge to provide the process information. This can be used as a stand-alone signal or in combination with in-situ PEM measurements to enhance the suite of possible 'sensors' used to decide on the direction and maintenance of the process.
机译:本文介绍了将快速和慢速反馈控制与测得的等离子体性能相结合的概念,以将系统运行维持在最佳水平,同时增加正常运行时间并降低能源成本。当以高速率转换模式保持有效的溅射工艺时,通常使用用于快速反馈控制的等离子发射监视(PEM)。缓慢的反馈可用于确定系统的状态并测量随时间变化的等离子体特性,并提供适当的校正或操作员警告。缓慢的反馈是“状态监视”,有助于预测维护周期和等离子工艺的失败。这将导致产品在给定的规格范围内。为了提供来自过程的更强大的PEM响应,说明了一种异位方法,该方法使用了典型Penning真空测量仪中的等离子体来提供过程信息。它可以用作独立信号,也可以与原位PEM测量结合使用,以增强用于确定过程方向和维护的一组可能的“传感器”。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号