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Electrochemical growth gold buffer layer on H-Si(111) surfaces and their applications

机译:H-Si(111)表面的电化学生长金缓冲层及其应用

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This paper reviews our recent work about gold electrodeposition on H-terminated Si(111). It is shown that Au(111)/Si(111) epitaxial layers are grown and that the film morphology can be varied according to the deposition conditions (potential and solution pH). At pH = 14 (cyanide solution) selective gold nucleation at the substrate monatomic step edges is observed. A homogeneous nucleation is obtained at pH 4 (chloride solution). In the former case 3D growth occurs and in the latter case ultra smooth buffer layers are obtained. Application of these substrates to formation of magnetic nanostructures with tuneable properties is demonstrated.
机译:本文回顾了我们最近关于在H端基Si(111)上电沉积金的工作。结果表明,生长了Au(111)/ Si(111)外延层,并且可以根据沉积条件(电势和溶液pH)改变膜的形态。在pH = 14(氰化物溶液)时,在底物单原子台阶边缘观察到选择性金成核。在pH 4(氯化物溶液)下获得均相成核。在前一种情况下,会发生3D生长,而在后一种情况下,会获得超光滑的缓冲层。证明了这些基板在具有可调节性质的磁性纳米结构的形成中的应用。

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