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Observations of TiO_2 Surfaces Using Totally Reflected X-ray In-plane Diffraction Under UV Irradiation

机译：紫外线照射下全反射X射线面内衍射在TiO_2表面的观察

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Surface lattice displacements of titanium dioxide (TiO_2: rutile) during ultra-violet (UV) light irradiation have been investigated using a total reflection x-ray diffraction, which provides a high signal to noise ratio (S/N) and superior in-plane surface diffraction. Under the environments in vapors of H_2O, CH_3OH, C_2H_5OH and C_3H_6OH, the photo-catalytic activities of TiO_2 (110), (100) and (001) surfaces subject to UV irradiation have been measured. It is found that the diffraction peaks and their full width half maxima (FWHMs) show some peculiarities with respect to the photo-catalytic activities in both surface lattices and adsorbed molecules in vapors. Furthermore, Kelvin force microscopy (KFM) has showed that there exists a very high surface potential, probably due to surface atom displacements induced by UV irradiation. With regard to the origin of the photo-catalytic activities, the induced surface potentials are discussed.
机译：使用全反射X射线衍射研究了紫外线（UV）照射过程中二氧化钛（TiO_2：金红石）的表面晶格位移，该位移可提供高信噪比（S / N）和出色的面内表面衍射。在H_2O，CH_3OH，C_2H_5OH和C_3H_6OH的蒸气环境下，测量了TiO_2（110），（100）和（001）受到紫外线照射的表面的光催化活性。发现衍射峰及其半峰全宽（FWHMs）在表面晶格和蒸气中吸附分子的光催化活性方面表现出一些特殊性。此外，开尔文力显微镜（KFM）显示存在非常高的表面电势，这可能是由于UV辐射引起的表面原子位移所致。关于光催化活性的起源，讨论了诱导的表面电势。

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