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Study on the Friction Behavior of HFCVD Diamond Films on Silicon Nitride Substrates

机译：氮化硅衬底上HFCVD金刚石薄膜的摩擦行为研究

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摘要

The friction behaviors of CVD diamond films on silicon nitride substrates are investigated comparing with the uncoated silicon nitride samples. Two types of CVD diamond films, namely MCD and NCD films, are deposited on the silicon nitride substrates using HFCVD method, and then SEM, while light interferometer, XRD and Raman spectra are employed to characterize as-deposited diamond films. The friction tests are carried out in a ball-on-plate reciprocating friction tester, with ball-bearing steel, copper, tungsten carbide and tungsten carbide as the counterpart materials. The results show that the diamond film deposited on silicon nitride substrate has significant effect on reducing the friction coefficient and enhancing the wear resistance. The friction coefficients of MCD and NCD films are around ~0.35 in dry sliding against ball-bearing steel and copper, while for sliding with the tungsten carbide and silicon nitride, the friction coefficients of NCD films even decrease as low as ~0.12 and ~0.08 respectively. The special wear rate of the silicon nitride and NCD film can be estimated as 6.2167×10-5 mm3 N-1 m-1 and 4.03×10-7 mm3 N-1 m-1 with the counterface of silicon nitride. Comparatively, no measurable wear occurs on the worn surface of the MCD film.
机译：与未涂覆的氮化硅样品相比，研究了CVD金刚石膜在氮化硅衬底上的摩擦行为。两种CVD金刚石膜，即MCD和NCD膜，先用HFCVD方法沉积在氮化硅衬底上，然后再用SEM沉积，同时使用光干涉仪，XRD和拉曼光谱表征沉积的金刚石膜。摩擦试验在球上往复式摩擦试验机中进行，轴承材料为钢，铜，碳化钨和碳化钨。结果表明，沉积在氮化硅衬底上的金刚石膜对降低摩擦系数和增强耐磨性具有显著作用。 MCD和NCD膜在与滚珠轴承钢和铜的干式滑动中的摩擦系数约为0.35，而对于与碳化钨和氮化硅的滑动，NCD膜的摩擦系数甚至低至〜0.12和〜0.08分别。氮化硅和NCD膜的特殊磨损率可以估计为6.2167×10-5 mm3 N-1 m-1和4.03×10-7 mm3 N-1 m-1。比较而言，在MCD薄膜的磨损表面上没有可测量的磨损发生。

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