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首页> 外文会议>Symposium on Covalently Bonded Disordered Thin-Film Materials held December 2-4, 1997, Boston, Massachusetts, U.S.A. >A field emission study of the critical parameters of amorphous carbon films deposited on a variety of carbonaceous substrates
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A field emission study of the critical parameters of amorphous carbon films deposited on a variety of carbonaceous substrates

机译：现场发射研究了沉积在多种碳质基底上的非晶碳膜的关键参数

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摘要

The field emission properties of a variety of nitrogen-containing hydrogenated amorphous carbon films have been characterised as a function of film thickness and substrate type. Identified trends have been discussed in terms of the optical band-gap and refractive index of the films, and the surface roughness of the substrates. In addition, carbon-based materials have been considered as inexpensive film-compatible substrates, and an in-situ oxygen plasma pre-treatment has been investigated as a means of changing the field enhancement factor of the system. We have achieved field emission with threshold voltages as low as 8 V mu m~(-1), and we present data that supports the view that the electron emission from amorphous carbon is dependent on the nature of the back contact, and possibly the ease at which the film can be fully depleted, i.e. film thickness.
机译：各种含氮氢化非晶碳膜的场发射特性已被表征为膜厚度和衬底类型的函数。已经根据膜的光学带隙和折射率以及基底的表面粗糙度讨论了确定的趋势。另外，碳基材料已被认为是廉价的膜相容性基底，并且已经研究了原位氧等离子体预处理作为改变系统的场增强因子的手段。我们已经实现了阈值电压低至8 Vμm〜（-1）的场发射，并且我们提供的数据支持以下观点：无定形碳的电子发射取决于背接触的性质，并且可能取决于其容易程度。膜可以完全耗尽时的厚度，即膜厚度。

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