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首页> 外文会议>Symposium on Growth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Structures, Nov 27-Dec 1, 2000, Boston, Massachusetts, U.S.A. >Mechanical response of diamond at nanometer scales: Diamond Polishing and Atomic Force Microscopy
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Mechanical response of diamond at nanometer scales: Diamond Polishing and Atomic Force Microscopy

机译：纳米级金刚石的机械响应：金刚石抛光和原子力显微镜

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摘要

Total energy pseudopotential methods are used to study two different processes involving the mechanical interaction of diamond nanoasperities and diamond surfaces: the wear processes responsible for diamond polishing, and the mechanical deformation of tip and surface during the operation of the Atomic Force Microscope in contact mode (CM-AFM). The strong asymmetry in the rate of polishing between different directions on the diamond (110) surface is explained in terms of an atomistic mechanism for nano-groove formation. The post-polishing surface morphology and the nature of the polishing residue predicted by this mechanism are consistent with experimental evidence. In the case of CM-AFM, our calculations show that a tip terminated in a single atom is able to sustain forces in excess of 30 nN. The magnitude of the normal force was unexpectedly found to be very similar for the approach on top of an atom or on a hollow position on the surface. This behaviour is due to tip relaxations induced by the interaction with the surface. These forces are also rather insensitive to the chemical nature of the tip apex.
机译：总能量伪势方法用于研究两个不同的过程，这些过程涉及金刚石纳米粗糙体和金刚石表面的机械相互作用：负责金刚石抛光的磨损过程以及原子力显微镜在接触模式下工作期间尖端和表面的机械变形（ CM-AFM）。在金刚石（110）表面上不同方向之间的抛光速率的强烈不对称是根据用于形成纳米槽的原子机理来解释的。通过这种机理预测的抛光后表面形态和抛光残留物的性质与实验证据一致。对于CM-AFM，我们的计算结果表明，终止于单个原子的尖端能够承受超过30 nN的力。出乎意料地发现，法向力的大小对于在原子顶部或表面上的空心位置处的进近非常相似。此行为是由于与表面的相互作用引起的尖端松弛。这些力也对尖端的化学性质不敏感。

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