GROWTH FRONT ROUGHENING OF ROOM TEMPERATURE DEPOSITED OLIGOMER THIN FILMS

机译：室温沉积低聚物薄膜的生长前粗加工

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Growth front scaling aspects are investigated for PPV-type oligomer thin films vapor-deposited onto silicon substrates at room temperature. For film thickness d～15-300 nm, commonly used in optoelectronic devices, correlation function measurement by atomic force microscopy yields roughness exponents in the range H=0.45+-0.04, and an rms roughness amplitude which evolves with film thickness as a power law σ∝ d~β with β=0.28+-0.05. The non-Gaussian height distribution and the measured scaling exponents (H and β) suggest a roughening mechanism close to that described by the Kardar-Parisi-Zhang scenario.

机译：研究了室温下气相沉积在硅基板上的PPV型低聚物薄膜的生长前沿缩放方面。对于光电器件中常用的d〜15-300 nm的膜厚，通过原子力显微镜进行的相关函数测量得出的粗糙度指数在H = 0.45 + -0.04范围内，并且均方根粗糙度幅值随膜厚度作为幂定律而变化σ∝ d〜β，β= 0.28 + -0.05。非高斯高度分布和测得的比例指数（H和β）表明粗糙化机制与Kardar-Parisi-Zhang情景所描述的近似。

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《Symposium on Growth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Structures, Nov 27-Dec 1, 2000, Boston, Massachusetts, U.S.A.》|2000年|p.6.20.1-6.20.6|共6页
会议地点 Boston MA(US);Boston MA(US)
作者
D. Tsamouras; G. Palasantzas; J. Th. M. De Hosson; G. Hadziioannou;
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Department of Polymer Chemistry Center, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands;

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正文语种 eng
中图分类无线电电子学、电信技术;
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3. Effects of growth temperatures on the physical properties of Cu_2ZnSnS_4 thin films deposited through spray pyrolysis for solar cell applications [J] . Fadavieslam M. R., Keshavarz S. Applied Physics . 2018,第2期

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机译：室温的生长前粗糙化沉积低聚物薄膜
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机译：温度，生长动力学和基底对RF轴外溅射沉积YBa（sub 2）Cu（sub 3）O（sub 7）薄膜微观结构的影响

GROWTH FRONT ROUGHENING OF ROOM TEMPERATURE DEPOSITED OLIGOMER THIN FILMS

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