Modelling surface growth in IBAD with rate equations

机译：使用速率方程对IBAD中的表面生长进行建模

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We develop a rate-equation model for surface growth in ion beam assisted deposition. In terms of the rate coefficients the model describes how island detachment and breakup, adatom diffusion and interlayer transitions of adatoms affect the growth. We identify parameter values corresponding to different modes of growth and discuss our results and ways to improve the model.

机译：我们为离子束辅助沉积中的表面生长建立了速率方程模型。在速率系数方面，该模型描述了岛分离和破碎，吸附原子扩散以及吸附原子的层间过渡如何影响生长。我们确定与不同增长方式相对应的参数值，并讨论我们的结果和改进模型的方法。

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《Symposium on Growth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Structures, Nov 27-Dec 1, 2000, Boston, Massachusetts, U.S.A.》|2000年|p.3.7.1-3.7.6|共6页
会议地点 Boston MA(US);Boston MA(US)
作者
Jussi K. Sillanpaeae; Ismo T. Koponen; Niels Gronbech-Jensen;
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Department of Applied Science, UC Davis, Davis, CA 95616, USA;

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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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2. Monte Carlo modeling of the IBAD growth of the optical films [J] . Waldemar Oleszkiewicz, Piotr Romiszowski Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2001,第4期

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4. Modelling surface growth in IBAD with rate equations [C] . Niels Gronbech-Jensen, Ismo T. Koponen, Jussi K. Sillanpaeae MRS Meeting . 2001

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Modelling surface growth in IBAD with rate equations

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