Structural and magnetoresistance studies of Ni/Co multilayers

机译：Ni / Co多层膜的结构和磁阻研究

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A study of ferromagnetic/ferromagnetic Ni/Co multilayers grown by DC magnetron sputtering with component layer thicknesses between 40 and 5A is presented. Structural characterization by small-angle x-ray reflectivity reveals high-quality lay-ered structures with a well-defined composition modulation along the film growth direction. Quantitative interpretation of the superlattice structure parameters, in cluding interface roughness and intermixing, has been performed by modelling the x-ray reflectivity data. Measurements of the magnetotransport properties of these multilayers indicate that the magnetoresistance (MR) effect, DELTA rho / rho , which is as high as 3.0

机译：提出了一种通过直流磁控溅射法生长成分层厚度在40至5A之间的铁磁/铁磁Ni / Co多层膜的研究。通过小角度X射线反射率的结构表征揭示了高质量的层状结构，沿着膜的生长方向具有明确的成分调制。通过建模X射线反射率数据，可以对超晶格结构参数进行定量解释，包括界面粗糙度和相互混合。对这些多层的磁输运性能的测量表明，磁阻（MR）效应DELTA rho / rho高达3.0

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《Symposium on Magnetic Ultrathin Films,Multilayers and Surface --1997 March 31-April 4,1997, San Francisco, California, U.S.A》|1997年|p.475-480|共6页
会议地点 San Francisco CA(US)
作者
J.M.Freitag; J.O.Strom-Olsen; Z.Altounian; R.W.Cochrane;
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中图分类物理学;
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2. Structural, magnetic properties and steep magnetoresistance change with low saturation magnetic fields in Co/Ni multilayer thin films [J] . Han D.H. IEEE Transactions on Magnetics . 1996,第5期

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Structural and magnetoresistance studies of Ni/Co multilayers

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