首页> 外文会议>Symposium on Magnetic Ultrathin Films,Multilayers and Surface --1997 March 31-April 4,1997, San Francisco, California, U.S.A >Observation of an exponential FeSi spacer thickness dependence of the antiferromagnetic exchange coupling in Fe/Si-based multilayers
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Observation of an exponential FeSi spacer thickness dependence of the antiferromagnetic exchange coupling in Fe/Si-based multilayers

机译:Fe / Si基多层膜中反铁磁交换耦合对FeSi间隔物厚度的指数依赖性的观察

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摘要

The magnetic interlayer exchange coupling in Fe/Si-based thin film structures employing sputtered multilayers with variations of Si-alloyed Fe for the magnetic layers and Fe-alloyed Si spacers, as well as wedge-shaped MBE-grown Fe/Si/Fe sandwich samples has been systematically studied. From structural and magnetic analysis it is concluded that ultrathin Si and Fe_xSi100-x (x<50) spacer layers transform into a crystalline iron silicide with a composition close to Fe_50Si_50. The exchange coupling mediated by this metallic silicide is antiferromagnetic and depends on the spacer thickness in an exponential, i.e. non-oscillatory, manner with a universial characteristic decay length of 3-4 A at room temperature. This observation can be qualitatively explained within the framework of a recent coupling theory on the premise that the FeSi interlayer has the metastable CsCl(B2)-structure.
机译:Fe / Si基薄膜结构中的磁性层间交换耦合,该结构使用具有多层Si合金化Fe的溅射多层作为磁性层和Fe合金化的Si隔离层,以及楔形MBE生长的Fe / Si / Fe三明治样本已得到系统地研究。从结构和磁性分析得出的结论是,超薄的Si和Fe_xSi100-x(x <50)隔离层转变为组成接近Fe_50Si_50的结晶硅化铁。由该金属硅化物介导的交换偶合是反铁磁性的,并且取决于间隔物的厚度,即在室温下具有3-4A的普遍特征衰减长度的指数方式即非振荡方式。在FeSi中间层具有亚稳CsCl(B2)结构的前提下,可以在最近的耦合理论的框架内定性地解释这种观察。

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