Nonlinear optical properties of plasma enhanced chemical vapour deposition grown silicon nanocrystals

机译：等离子体增强化学气相沉积生长的硅纳米晶体的非线性光学性质

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We present a systematic study on the nonlinear optical properties of silicon nanocrystals (Si-nc) grown by plasma enhanced chemical vapour deposition (PECVD). The sign and magnitude of both real and imaginary parts of third-order nonlinear susceptibility X~((3)) of Si-nc are measured by Z-scan method. While the closed aperture Z-scan reveals a sign of positive nonlinearity, the open aperture measurements suggests a nonlinear absorption coefficients. Absolute values of x~((3)) are in the order of 10~(-9) esu and show systematic correlation with the Si-nc size, due to quantum confinement related effects.

机译：我们目前对通过等离子体增强化学气相沉积（PECVD）生长的硅纳米晶体（Si-nc）的非线性光学性质进行系统研究。用Z扫描法测量了Si-nc的三阶非线性磁化率X〜（（3））的实部和虚部的符号和大小。闭孔Z扫描显示出正非线性迹象，而开孔测量表明存在非线性吸收系数。由于量子限制相关效应，x〜（（3））的绝对值约为10〜（-9）esu，并且与Si-nc尺寸显示出系统相关性。

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《Symposium on Materials and Devices for Optoelectronics and Microphotonics, Apr 1-5, 2002, San Francisco, California》|2002年|p.219-222|共4页
会议地点 San Francisco CA(US);San Francisco CA(US)
作者
G. Vijaya Prakash; M. Cazzanelli; Z. Gaburro; L. Pavesi; F. Iacona; F. Priolo;
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作者单位

INFM and Dipartimento di Fisica, Universita di Trento, via Sommarive 14, 38050, Povo, Trenlo, Italy;

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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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专利

1. Linear and nonlinear optical properties of plasma-enhanced chemical-vapour deposition grown silicon nanocrystals [J] . G. Vijaya, M. Cazzanelli, Z. Gaburro, Journal of Modern Optics . 2002,第5a6期

机译：等离子体增强化学气相沉积法生长的硅纳米晶体的线性和非线性光学性质
2. Structural, optical and mechanical properties of thin diamond and silicon carbide layers grown by low pressure microwave linear antenna plasma enhanced chemical vapour deposition [J] . Taylor Andrew, Drahokoupil Jan, Fekete Ladislav, Diamond and Related Materials . 2016,第Null期

机译：低压微波线性天线等离子体增强化学气相沉积形成的金刚石和碳化硅薄层的结构，光学和机械性能
3. Excitation mechanism and thermal emission quenching of Tb ions in silicon rich silicon oxide thin films grown by plasma-enhanced chemical vapour deposition-Do we need silicon nanoclusters? [J] . A. Podhorodecki, L. W. Golacki, G. Zatryb, Journal of Applied Physics . 2014,第14期

机译：通过等离子体增强化学气相沉积法生长的富硅氧化硅薄膜中Tb离子的激发机理和热发射猝灭-是否需要硅纳米团簇？
4. Nonlinear optical properties of plasma enhanced chemical vapour deposition grown silicon nanocrystals [C] . G. Vijaya Prakash, M. Cazzanelli, Z. Gaburro, Materials Research Society Symposium . 2002

机译：等离子体增强化学气相沉积的非线性光学性能生长硅纳米晶体
5. High-Quality Amorphous-Crystalline Silicon Heterostructures Using the Grid-Based Triode Radio-Frequency Plasma Enhanced Chemical Vapour Deposition Method. [D] . Mahtani, Pratish. 2014

机译：使用基于栅格的三极管射频等离子增强化学气相沉积法获得高质量的非晶态晶体硅异质结构。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

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7. Structural and optical properties of Au-catalyzed SiNWs grown using pulsed plasma-enhanced chemical vapour deposition [O] . Al-Taay, H.F., Mahdi, M.A., Parlevliet, D., 2013

机译：脉冲等离子体增强化学气相沉积法生长的金催化的SiNWs的结构和光学性质

Nonlinear optical properties of plasma enhanced chemical vapour deposition grown silicon nanocrystals

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