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首页> 外文会议>Symposium on Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures, Apr 17-20, 2001, San Francisco, California >Nanoindentation and Microstructural Evolution Studies of DC Magnetron Sputtered Chromium Nitride Thin Films
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Nanoindentation and Microstructural Evolution Studies of DC Magnetron Sputtered Chromium Nitride Thin Films

机译：直流磁控溅射氮化铬薄膜的纳米压痕和微观结构演变研究

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摘要

Nanoindentation experiments have been performed to assess the mechanical behavior of chromium nitride (Cr_xN_y) thin films sputtered in different deposition geometries and with varying Ar and N_2 pressures. The hardness and elastic modulus of chromium nitrides are of great interest with regard to their applications. In the present work, two different deposition geometries, i.e. multi-substrate and confocal, were used to sputter (DC magnetron) a Cr_xN_y layer on Si (100) wafers at varying nitrogen flow rates. The results of the nanoindentation experiments indicate that, over a similar argon and nitrogen regime, the Cr_xN_y films grown in a multi-substrate geometry exhibit higher hardness and elastic modulus on the average than those grown in the confocal geometry. Furthermore, it was found that in the multi-substrate geometry the hardness and elastic modulus of the films were significantly higher than those in the confocally deposited films for a specific regime of the nitrogen flow rate (10-14 sccm). Finally, observations of the mechanical properties trends could be correlated with a higher degree of anisotropic stress for films grown in the multi-substrate in comparison to the confocal geometry.
机译：已经进行了纳米压痕实验，以评估以不同的沉积几何形状以及变化的Ar和N_2压力溅射的氮化铬（Cr_xN_y）薄膜的机械性能。就氮化铬的应用而言，其硬度和弹性模量引起了极大的关注。在本工作中，使用两种不同的沉积几何形状，即多基板和共聚焦，以不同的氮气流速在Si（100）晶片上溅射（DC磁控管）Cr_xN_y层。纳米压痕实验的结果表明，在类似的氩气和氮气条件下，以多基板几何形状生长的Cr_xN_y膜平均显示出比共焦几何形状更高的硬度和弹性模量。此外，发现在特定的氮气流量范围（10-14 sccm）下，在多基板几何结构中，薄膜的硬度和弹性模量明显高于共聚焦沉积的薄膜。最后，与共焦几何形状相比，在多基板中生长的薄膜的机械性能趋势的观察结果可能与更高程度的各向异性应力相关。

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