首页> 外文会议>Symposium on Multicomponent Oxide Films for Electronics held April 6-8,1999,San francisco,California,U.S.A. >Thermal annealing effects in vanadium pentoxide films intercalated with Eu~3+
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Thermal annealing effects in vanadium pentoxide films intercalated with Eu~3+

机译:Eu〜3 +嵌入的五氧化二钒薄膜的热退火效应

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This work reports on the spectroscopic properties of europium ions intercalated in a vanadium pentoxide matrix, as well as the effects of thermal treatment on its structural and electronic properties. X-ray diffraction. TG/DTA ESR, luminescence as well as XANES were used in order to characterize the intercalation compound. For the as grown samples, the intercalation of Eu~3+ is observed to have little effect in the V_2O_5 lamellar structure, however the inter-planar spacing grows from 1.19 nm to 1.33 nm for a 10
机译:这项工作报道了嵌入五氧化二钒基体中的离子的光谱性质,以及热处理对其结构和电子性质的影响。 X射线衍射。使用TG / DTA ESR,发光以及XANES来表征插层化合物。对于生长的样品,观察到Eu〜3 +的嵌入对V_2O_5层状结构几乎没有影响,但是对于10微米,平面间距从1.19 nm增加到1.33 nm

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