首页> 外文会议>Symposium on Progress in Semiconductors Ⅱ―Electronic and Optoelectronic Applications Dec 2-5, 2002 Boston, Massachusetts, U.S.A. >Effects of MOCVD Growth Conditions on Optical and Structural Properties of GaInNAs/GaAs/InGaAs/GaAs Quantum Wells
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Effects of MOCVD Growth Conditions on Optical and Structural Properties of GaInNAs/GaAs/InGaAs/GaAs Quantum Wells

机译:MOCVD生长条件对GaInNAs / GaAs / InGaAs / GaAs量子阱光学和结构性质的影响

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摘要

Effects of MOCVD growth parameters on structural and optical properties of double-quantum-well structures containing uncoupled GaInNAs/GaAs and InGaAs/GaAs quantum wells have been investigated. By varying growth temperature, growth rate, Ⅴ/Ⅲ ratio, and DMHy flow rates, we have achieved a longer-wavelength emission from a GaInNAs well than from an InGaAs well grown in the same structure. GalnNAs/GaAs multiple-quantum-well structures grown under optimum conditions emitted at 1.25μm.
机译:研究了MOCVD生长参数对包含未耦合GaInNAs / GaAs和InGaAs / GaAs量子阱的双量子阱结构的结构和光学性质的影响。通过改变生长温度,生长速率,Ⅴ/Ⅲ比和DMHy流量,我们获得了比在相同结构中生长的InGaAs阱更长的波长发射。在最佳条件下生长的GalnNAs / GaAs多量子阱结构以1.25μm发射。

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