Electrochemical pitting and pepassivation on icosahedral Al-Cu-Fe,and a comparison with crystalline phases

机译：二十面体Al-Cu-Fe的电化学点蚀和钝化处理以及与晶相的比较

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We report the electrochemical potentials at which localized pitting and repassivation occur on icosahedral Al-Cu-Fe,and on a series of related alloys and elemental metals.The electrochemcistry occurs in a buffered NaCl solution,pH 8.4. Under these conditiosns,pitting and repassivation appear to be controlled mainly be the chaemical composition of the alloy,although the quasicrystalline phase displays an anomalous resistance to repassivation.Corrosion of this phase proceeds by dissolution of Al and Fe,leaving behind pits which are Cu-enriched.

机译：我们报告了在二十面体Al-Cu-Fe以及一系列相关合金和元素金属上发生局部点蚀和再钝化的电化学势。电化学是在pH 8.4的NaCl缓冲溶液中进行的。在这些条件下，尽管准晶相显示出对反钝化的反常性，但点蚀和再钝化似乎主要是由合金的化学成分控制的。该相的腐蚀通过Al和Fe的溶解而进行，而留下了Cu-丰富。

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《Symposium on Quasicrystals held November 30-December 2,1998,Boston,Massachusetts,U.S.A.》|1998年|p.275-280|共6页
会议地点 Boston MA(US)
作者
Nicholas A.Spurr; Patrick J.Pinhero; Daniel J.Sordelet; kurt R.Hebert; Patricia A.Thiel;
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Electrochemical pitting and pepassivation on icosahedral Al-Cu-Fe,and a comparison with crystalline phases

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