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Modelling of PVC Processes

机译:PVC工艺建模

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摘要

The characterization and the modelling of the flux of the different particles impinging on the growing film, in the PVD techniques, are the main purposes of this paper.rnThe principal techniques used industrially that is to say : vacuum evaporation, magnetron sputtering, vacuum arc deposition and ion plating are considered. The deposition of metallic coatings as well as that of compound materials (ceramics materials) are studied.rnThe objective is to predict and to compare, for each deposition process, the characteristics : nature, energy, etc... of the particles impinging on the growing film. In all cases the creation of the different species, their transport from the source to the substrate are analysed. The metallic and non metallic species are taken into account.rnSome examples are given to illustrate the influence of the characteristics of the forming particles on the structural properties and morphology of the films obtained by different techniques.
机译:在PVD技术中,表征和撞击在生长膜上的不同粒子的通量是本文的主要目的。rn工业上使用的主要技术是:真空蒸发,磁控溅射,真空电弧沉积和离子镀被考虑。研究了金属涂层以及复合材料(陶瓷材料)的沉积.rn目的是针对每个沉积过程预测并比较撞击在金属涂层上的颗粒的特性:性质,能量等。电影。在所有情况下,都要分析不同物种的产生,从源到底物的迁移。考虑到金属和非金属种类。给出一些例子来说明形成颗粒的特性对通过不同技术获得的膜的结构性质和形态的影响。

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