Optical Emission Spectroscopy in High Target Powder Density Magnetron Source

机译：高目标粉末密度磁控管源的发射光谱

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The magnetron dc sputtering of aluminium and titanium targets in an argon atmosphere was performed at high power density up to 300 W/cm2. The spectra of emitted light, in visible and near infrared region, were recorded. The neutral argon lines showed the same square root dependence on target current for both target materials. Significant differences in such dependence were observed for metal emitted lines. In the titanium case line intensities tended to saturation.

机译：在高达300 W / cm2的高功率密度下，在氩气气氛中对铝和钛靶进行磁控直流溅射。记录在可见光和近红外区域中发射的光的光谱。对于两种靶材，中性氩线均显示出对靶电流相同的平方根依赖性。对于金属发射线，观察到这种依赖性的显着差异。在钛的情况下，线强度趋于饱和。

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来源
《Trends and new applications of thin films》|1998年|311-314|共4页
会议地点 Regensburg(DE);Regensburg(DE)
作者
A. Brudnik; W. Posadowski; A. Czapla;
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作者单位

University of Mining and Metallurgy, Institute of Electronics, al.Mickiewicza 30, PL-30-059 Krakow, Poland;

Technical University, Institute of Electronic Technology, ul.Janiszewskiego 11/17, 50-372 Wroclaw, Poland;

University of Mining and Metallurgy, Institute of Electronics, al.Mickiewicza 30, PL-30-059 Krakow, Poland;

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会议组织
原文格式 PDF
正文语种 eng
中图分类薄膜物理学;
关键词
DC magnetron sputtering; emission spectroscopy;

机译：直流磁控溅射；发射光谱;

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2. Titanium density analysed by optical absorption and emission spectroscopy in a dc magnetron discharge [J] . Gaillard M, Britun N, Kim YM, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2007,第3期

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4. Optical Emission Spectroscopy in High Target Powder Density Magnetron Source [C] . International symposium on trends and new applications of thin films;TATF '98 . 1998

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Optical Emission Spectroscopy in High Target Powder Density Magnetron Source

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