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Surface and Thin Film Analysis with Electron and Mass Spectrometric Techniques

机译:电子和质谱技术的表面和薄膜分析

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We give a short overview of recent analytical techniques for compositional surface analysis and the determination of concentration depth profiles. More specifically, the principle, the instrumentation and the performance of the routinely used electron spectroscopic and mass spectrometric methods, namely Photo- and Auger Electron Spectroscopy PES and AES, resp. Secondary Ion and Secondary Neutral Mass Spectrometry SIMS and SNMS, are described. The application of these techniques to the analysis of thin film structures is demonstrated by corresponding practical examples. The potentialities of the different techniques are specifically addressed with regard to the quantitation of the measured data, detection limits for trace analysis as well as the spatial resolution both in directions parallel and perpendicular to the sample surface.
机译:我们简要概述了成分表面分析和浓度深度分布测定的最新分析技术。更具体地说,分别是常规使用的电子光谱和质谱方法的原理,仪器和性能,分别是光电和俄歇电子能谱PES和AES。描述了二次离子和二次中性质谱SIMS和SNMS。这些技术在薄膜结构分析中的应用通过相应的实例进行了演示。在测量数据的定量,痕量分析的检测极限以及与样品表面平行和垂直的方向上的空间分辨率方面,专门解决了不同技术的潜力。

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