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首页> 外文会议>Twenty-First Annual Meeting of the American Society for Precision Engineering >DEVELOPMENT OF A NANO-STEREOLITHOGRAPHY SYSTEM USING EVANESCENT LIGHT FOR SUBMICRON FABRICATION
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DEVELOPMENT OF A NANO-STEREOLITHOGRAPHY SYSTEM USING EVANESCENT LIGHT FOR SUBMICRON FABRICATION

机译：亚微米级制造的基于隐身光的纳米立体照相术系统的开发

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摘要

We developed the nano-stereolithography system using evanescent light, which mainly consists of a laser at 488nm, a high-powerrnobjective with a numerical aperture of 1.65, and a PZT stage, accuracy positioning of which is 1 nanometer.rnTwo fundamental experiments were carried out with this system for verifying the imaging system and the lamination process. In the first experiment, a discoidal cured resin with a groove, the width of which was about 900 nanometers, was fabricated. In the second experiment, nano-steps were fabricated, the thickness of which were about 500 nanometers.rnThese facts suggest that complex submicron structures such as microchannels and photonic crystals could be fabricated with our proposed method.
机译：我们开发了使用e逝光的纳米立体光刻系统，该系统主要由488nm的激光器，数值孔径为1.65的高功率物镜和PZT平台组成，其精确定位为1纳米.rn进行了两个基础实验使用该系统来验证成像系统和层压过程。在第一个实验中，制造了具有凹槽的盘状固化树脂，其宽度约为900纳米。在第二个实验中，制造了纳米台阶，其厚度约为500纳米。这些事实表明，使用我们提出的方法可以制造复杂的亚微米结构，例如微通道和光子晶体。

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