首页> 外文会议>World Tribology Congress III vol.1; 20050912-16; Washington,DC(US) >TRIBOCHEMICAL REACTIONS AT THE WATER-LUBRICATED SILICON NITRIDE INTERFACE: GEL FORMATION MECHANISM
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TRIBOCHEMICAL REACTIONS AT THE WATER-LUBRICATED SILICON NITRIDE INTERFACE: GEL FORMATION MECHANISM

机译:水润滑的硅氮化物界面的摩擦化学反应:凝胶形成机理

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Silicon-based ceramics such as silicon nitride can be very effectively lubricated by water under certain conditions (1-3). After a wear-in period a condition of very low friction coefficient ( < 0.01) can be achieved for average contact pressures of 40 MPa and lower. Tomizawa & Fischer (1) proposed a chemomechanical polishing mechanism to reduce surface roughness enabling the onset of hydrodynamic lubrication by water. We suggest that there is an additional soft hydrated silica gel layer adhering to the rubbing surfaces that provides a deformable protective film to enable effective hydrodynamic lubrication of water and protect the surfaces from occasional asperity contacts. The existence of such films was indicated by the nanomechanical data performed on worn surfaces.
机译:在某些条件下(1-3),水可以非常有效地润滑硅基陶瓷(例如氮化硅)。磨合期过后,对于40 MPa及以下的平均接触压力,可以实现极低的摩擦系数(<0.01)。 Tomizawa&Fischer(1)提出了一种化学机械抛光机制,以减少表面粗糙度,从而开始用水进行流体动力润滑。我们建议在摩擦表面上粘附一个附加的软化水合硅胶层,该层可提供可变形的保护膜,从而能够对水进行有效的流体动力润滑,并保护表面免受偶然的粗糙接触。通过在磨损表面上进行的纳米力学数据表明了这种膜的存在。

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