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首页> 外文学位 >Manufacture of a reflective Spatial Light Modulator integrated directly onto CMOS electronics.
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Manufacture of a reflective Spatial Light Modulator integrated directly onto CMOS electronics.

机译：直接集成到CMOS电子产品的反射型空间光调制器的制造。

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This dissertation describes design, fabrication, and electromechanical characterization of a new kind of micromirror array that is capable of high spatial resolution, high speed control of an optical beam. The device is a micromachined reflective Spatial Light Modulator (SLM) made by integrating a segmented, movable micromirror array made using metal Micro-Electro-Mechanical-Systems (MEMS) fabrication techniques with Complementary-Metal-Oxide-Semiconductor (CMOS) driver electronics. The mirror is comprised of an array of 22,500 electrostatic actuators, each supporting a single mirror segment up to 775nm, which corresponds to 2pi modulation of optical phase for a reflected 1550nm wavelength communication laser beam. Each mirror segment is addressed through foundry-prefabricated CMOS driver electronics, which can provide 4-bit resolution phase control (i.e. 50nm surface-normal resolution)†.; Two major technical challenges are associated with direct modular integration of MEMS on CMOS; development of MEMS fabrication processes that do not damage underlying CMOS electronics, and manufacturing of optical quality micromirror components using multi-layer surface micromachining techniques. To overcome these challenges, foundry-prefabricated CMOS driver electronics were coated with a thick dielectric film, and then planarized by die-level Chemical Mechanical Polishing (CMP). Next, a manufacturing process was developed to interconnect between MEMS and CMOS layers. Finally, a low temperature metal and polymer MEMS process was developed to produce actuators and highly planar optical quality mirror segments. Significant contributions to the existing MEMS state-of-the-art embodied in this work include innovative processes for reducing effects of print-through, and a new method to control residual stress while avoiding permanent plastic deformation in structural film upon sacrificial removal. The developed manufacturing process is robust and promises low cost mass production.; Manufactured SLMs were shown to have a stroke of up to 900nm, less than lambda/30 surface non-planarity, 90% mirror fill factor, exceptional position repeatability, and reliability. Full integration was demonstrated by addressing mirror segments in a predetermined electrodes control pattern. Several tens of kilohertz operation was verified at the pixel level. Combined static and dynamic functioning test results promise ultimately a path to a greatly simplified open-loop Adaptive Optics (AO) system with unprecedented high precision and economy.; †A complementary graduate program led by Duk-Joong Kim focused on design and fabrication of the electronics for this project
机译：本文描述了一种新型的微镜阵列的设计，制造和机电特性，该阵列能够实现高空间分辨率和光束的高速控制。该设备是一种微机械反射式空间光调制器（SLM），通过将使用金属微电子机械系统（MEMS）制造技术制成的分段可移动微镜阵列与互补金属氧化物半导体（CMOS）驱动器电子器件集成在一起而制成。该反射镜由22,500个静电致动器的阵列组成，每个静电致动器都支持单个反射镜段，最大可达775nm，这对应于反射的1550nm波长通信激光束的2π光学相位调制。每个镜面段都通过代工预制的CMOS驱动器电子设备解决，该电子设备可以提供4位分辨率的相位控制（即50nm表面法向分辨率）†。 MEMS在CMOS上的直接模块化集成涉及两个主要的技术挑战；开发不损坏底层CMOS电子器件的MEMS制造工艺，以及使用多层表面微加工技术制造光学质量的微镜组件。为了克服这些挑战，在铸造厂预制的CMOS驱动器电子产品上涂覆了厚电介质膜，然后通过芯片级化学机械抛光（CMP）进行了平面化。接下来，开发了制造工艺以在MEMS和CMOS层之间互连。最后，开发了一种低温金属和聚合物MEMS工艺，以生产执行器和高度平面的光学质量镜段。在这项工作中体现的对现有MEMS最新技术的重大贡献包括减少印刷穿透效应的创新工艺，以及控制残余应力同时避免牺牲去除时结构膜永久塑性变形的新方法。发达的制造工艺很坚固，有望实现低成本的批量生产。事实证明，制造的SLM的行程最大为900nm，小于lambda / 30表面非平面性，镜面填充系数为90％，具有出色的位置重复性和可靠性。通过以预定的电极控制图案寻址镜段来证明完全集成。在像素级别验证了几十千赫兹的操作。组合的静态和动态功能测试结果最终有望成为一种以前所未有的高精度和经济性大大简化开环自适应光学（AO）系统的途径。 †由Duk-Joong Kim领导的补充研究生计划，专注于该项目的电子产品设计和制造

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