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Simulation and Implementation of Moth-eye Structures as a Broadband Anti-Reflective Layer.

机译：蛾眼结构作为宽带抗反射层的仿真与实现。

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摘要

Conventional single layer thin anti-reflective coatings (ARCs) are only suitable for narrowband applications. A multilayer film stack is often employed for broadband applications. A coating of multiple layers with alternating low and high refractive index materials increases the overall cost of the system. This makes multilayer ARCs unsuitable for low-cost broadband applications. Since the discovery of moth-eye corneal nipple patterns and their potential applicability in the field of broadband ARCs, many studies have been carried out to fabricate these bio-inspired nanostructures with available manufacturing processes. Plasma etching processes used in microelectronic manufacturing are applied for creating these nanostructures at the Rochester Institute of Technology's Semiconductor & Microsystems Fabrication Laboratory (SMFL). Atomic Force Microscope (AFM) scanned surfaces of the nanostructure layer are simulated and characterized for their optical properties using a Finite-Difference Time Domain (FDTD) simulator from Lumerical Solutions, Inc. known as FDTD Solutions. Simulation results show that the layer is anti-reflective over 50 to 350 nm broadband of wavelengths at 0° angle of incidence. These simulation results were supported by ellipsometer reflection measurements off the actual samples at multiple angles of light incidence, which show a 10% to 15% decrease in reflection for 240 to 400 nm wavelengths. Further improvements in the optical efficiency of these structures can be achieved through simulation-fabrication-characterization cycles performed for this project. The optimized nanostructures can then serve the purpose of low-cost anti-reflective coatings for solar cells and similar applications.
机译：常规的单层薄抗反射涂层（ARC）仅适用于窄带应用。多层膜堆叠通常用于宽带应用。用交替的低折射率材料和高折射率材料的多层涂层增加了系统的总成本。这使得多层ARC不适合低成本宽带应用。自从发现蛾眼角膜乳头图案及其在宽带ARC领域的潜在适用性以来，已经进行了许多研究，以利用可用的制造工艺来制造这些具有生物启发性的纳米结构。罗彻斯特理工学院的半导体与微系统制造实验室（SMFL）将微电子制造中使用的等离子体蚀刻工艺用于创建这些纳米结构。使用Lumerical Solutions，Inc.的有限时差（FDTD）模拟器（称为FDTD Solutions）对纳米结构层的原子力显微镜（AFM）扫描的表面进行仿真并对其光学特性进行表征。仿真结果表明，该层在入射角为0°的50至350 nm波长宽带上具有抗反射性。椭圆偏振仪在多个入射光角度下对实际样品的反射测量得到了这些模拟结果的支持，对于240至400 nm波长，其反射率降低了10％至15％。这些结构的光学效率的进一步提高可以通过对该项目执行的模拟-制造-表征周期来实现。然后，经过优化的纳米结构可以达到用于太阳能电池和类似应用的低成本减反射涂层的目的。

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  • 作者

    Deshpande, Ketan S.;

  • 作者单位

    Rochester Institute of Technology.;

  • 授予单位 Rochester Institute of Technology.;
  • 学科 Physics Optics.;Engineering Materials Science.
  • 学位 M.S.
  • 年度 2013
  • 页码 72 p.
  • 总页数 72
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 公共建筑;
  • 关键词

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