首页> 外文学位 >Caracterizacion y crecimiento de peliculas delgadas de GaN dopadas con tierras raras por el metodo de deposicion por laser pulsado (Spanish text).
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Caracterizacion y crecimiento de peliculas delgadas de GaN dopadas con tierras raras por el metodo de deposicion por laser pulsado (Spanish text).

机译:通过脉冲激光沉积法表征和掺杂了稀土的GaN薄膜(西班牙文)。

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摘要

The wide band gap semiconductor GaN doped with rare earths is of great interest in electronic and optoelectronic applications, because of its capability for emission in the visible and infrared spectrum when photostimulated. The study of these materials allows expansion of applications of light emitting devices, solid-state lasers, flat panels, optic detectors and optical storage devices. This semiconductor has been broadly investigated and fabricated with the use of various techniques such as Metal Organic Molecular Beam Epitaxy (MOMBE), Chemical Vapor Deposition (CVD), and Molecular Beam Epitaxy (MBE), and doped in situ by evaporation of the doping material or ex situ by ion implantation. The technique used in this research was Pulsed Laser Deposition (PLD) and materials were doped in situ with the use of a thermal evaporator.; It was possible to dope GaN with Er and Pr obtaining thin films with good crystal quality and surface morphology, and with uniform granular distribution. A series of thin films using different fluxes of doping material were grown, in order to find adequate parameter for photoluminescence of the rare earth on these materials. The optical properties of these thin films were studied by photoluminescence spectroscopy, but it was not possible to observe luminescence by the dopants.; Thin films of GaN by PLD with a GaN were grown buffer and without the use of a buffer and these were compared by means of results of the optical microscope, X ray diffraction (XRD), atomic force microscope (AFM) and photo spectroscopy, showing very similar characteristics.
机译:掺杂有稀土的宽带隙半导体GaN在电子和光电应用中引起了极大的兴趣,因为它具有在受光刺激时能够在可见光谱和红外光谱中发射的能力。对这些材料的研究可以扩展发光器件,固态激光器,平板,光学探测器和光学存储设备的应用范围。使用各种技术,例如金属有机分子束外延(MOMBE),化学气相沉积(CVD)和分子束外延(MBE),对该半导体进行了广泛的研究和制造,并通过蒸发掺杂材料进行原位掺杂。或通过离子注入进行异位。该研究中使用的技术是脉冲激光沉积(PLD),并使用热蒸发器原位掺杂材料。可以用Er和Pr掺杂GaN,以获得具有良好晶体质量和表面形态以及均匀颗粒分布的薄膜。生长一系列使用不同掺杂材料通量的薄膜,以便为这些材料上的稀土光致发光找到合适的参数。通过光致发光光谱法研究了这些薄膜的光学性质,但是不可能通过掺杂剂观察到发光。在不使用缓冲液的情况下,通过使用GaN的PLD来生长GaN薄膜,并通过光学显微镜,X射线衍射(XRD),原子力显微镜(AFM)和光谱的结果进行比较,显示非常相似的特征。

著录项

  • 作者单位

    University of Puerto Rico, Mayaguez (Puerto Rico).;

  • 授予单位 University of Puerto Rico, Mayaguez (Puerto Rico).;
  • 学科 Agriculture Plant Pathology.
  • 学位 M.S.
  • 年度 2005
  • 页码 77 p.
  • 总页数 77
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 植物病理学;
  • 关键词

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