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Genetic characterization and mapping of partial resistance to early blight in diploid potato.

机译：二倍体马铃薯对早疫病的部分抗性的遗传特征和定位。

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摘要

Early blight (EB), caused by Alternaria solani Sorauer, is one of the main foliar diseases of potato (Solanum tuberosum L.). Yield losses up to 40% occur in some years. Plant protection by fungicide application is possible but planting a disease resistant cultivar would be preferable. A diploid hybrid family of 219 clones from Solanum phureja x Solanum stenotomum was evaluated for EB resistance over three years in Pennsylvania. Disease severity was assessed for each clone throughout the development of the epidemic and area under disease progress curves (AUDPC) were calculated. There were significant differences among the clones for AUDPC. Resistance to EB appears to be inherited quantitatively based on the distribution of AUDPC values. Broad-sense heritability of EB resistance in this family was estimated as 0.77 with a 95% confidence interval of 0.71 to 0.82. There were significant clone x year interactions. Further partitioning of the clone x year interaction revealed that 75 clones made significant contributions to this interaction, and therefore, their resistance to EB was not stable. In this family, a negative correlation (r = -0.448, p 0.0001) was observed between mean AUDPC and earliness in maturity, indicating that plant maturity explained about 20% of the variation in disease reaction. However, some clones were identified with considerable EB resistance and early or mid-season maturity, suggesting that resistance from the parental clones might be useful for breeding early-maturing as well as EB resistant cultivars. This partial resistance has been genetically characterized by quantitative trait loci (QTL) mapping. Fluorescence-based, semi-automated amplified fragment length polymorphism (AFLP) and simple sequence repeat (SSR) marker techniques were used to generate a genetic map. 170 AFLP and 47 SSR polymorphic markers were developed and analyzed for this full-sib family and 15 linkage groups were identified. Thirty eight of common AFLP markers and 44 of SSR markers were used to anchor 12 of the 15 linkage groups to 12 potato chromosomes. The markers covered 925 centiMorgan (cM) of genome with an average distance of 4.5 cM between adjacent markers, and less than 15% of the genome lies more than 20 cM from the nearest marker. Quantitative trait loci (QTLs) for partial resistance to EB and for foliage maturity were mapped using the "Multiple-QTL models" (MQM) method with putative QTL markers from interval mapping as cofactors. Five QTLs on chromosome IV, V, IX, XI and XII were identified for EB resistance that collectively explained 62.2% of the total phenotypic variation. Three QTLs on chromosome IV, V and VI were identified for foliage maturity that collectively explained 97.5% of the total phenotypic variation. Two QTLs for EB resistance and foliage maturity on chromosome IV and V were mapped in the same or closely linked regions. The other three QTLs for EB resistance on chromosome IX, XI and XII, which accounted for 33.1% of the total phenotypic variation and were not linked to foliage maturity, have the potential to improve EB resistance using marker-assisted selection (MAS) in a breeding program.
机译：马铃薯白斑病（Alternaria solani Sorauer）引起的早疫病（EB）是马铃薯（Solanum tuberosum L.）的主要叶面疾病之一。某些年份会发生高达40％的产量损失。通过施用杀真菌剂来保护植物是可能的，但是优选种植抗病品种。在宾夕法尼亚州的三年中，对来自茄属茄和马铃薯茄的219个克隆的二倍体杂交家族进行了EB耐药性评估。在整个流行过程中评估每个克隆的疾病严重程度，并计算疾病进展曲线（AUDPC）下的面积。 AUDPC的克隆之间存在显着差异。根据AUDPC值的分布，对EB的抗药性似乎是遗传的。该家族中EB耐药的广义遗传性估计为0.77，95％置信区间为0.71至0.82。存在显着的克隆x年交互作用。克隆x年相互作用的进一步划分显示，有75个克隆对此相互作用做出了重大贡献，因此，它们对EB的抗性不稳定。在这个家庭中，平均AUDPC与成熟度之间存在负相关性（r = -0.448，p <0.0001），这表明植物成熟度解释了疾病反应中约20％的变化。然而，鉴定出一些克隆具有相当大的EB抗性和季节早期或中期成熟，这表明来自亲本克隆的抗性可能对育种早熟和EB抗性品种有用。这种局部抗性已通过数量性状基因座（QTL）定位进行了遗传表征。基于荧光的半自动化扩增片段长度多态性（AFLP）和简单序列重复（SSR）标记技术被用于生成遗传图谱。开发了170个AFLP和47个SSR多态性标记，并对其进行了分析，鉴定了15个连锁组。 38个常见的AFLP标记和44个SSR标记用于将15个连锁组中的12个锚定到12个马铃薯染色体上。这些标记覆盖了925厘摩（cM）的基因组，相邻标记之间的平均距离为4.5 cM，不到最近的标记的基因组中有不到15％位于20 cM以上。使用“ Multiple-QTL模型”（MQM）方法绘制了部分抗EB和叶片成熟的数量性状基因座（QTL），并从间隔作图推定了QTL标记作为辅助因子。鉴定了IV，V，IX，XI和XII染色体上的五个QTL的EB耐药性，这些QTL共同解释了总表型变异的62.2％。确定了第IV，V和VI号染色体上的三个QTL的叶子成熟度，这些QTL共同解释了总表型变异的97.5％。在相同或紧密联系的区域中绘制了两个针对IV和V染色体的EB抗性和叶子成熟度的QTL。染色体IX，XI和XII上的其他三个EB抗性QTL占总表型变异的33.1％，并且与叶的成熟度没有关系，它们有可能在玉米中使用标记辅助选择（MAS）来提高EB抗性。繁殖计划。

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