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Characterization and modeling of a compact ECR plasma source designed for materials processing.

机译：设计用于材料加工的紧凑型ECR等离子体源的表征和建模。

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摘要

A compact ECR ion/free-radical source designed for materials processing is experimentally characterized and modeled under conditions typical for materials processing. Specifically, argon, hydrogen and hydrogen-argon discharges are created and studied in a compact microwave ECR (electron cyclotron resonance) plasma source operating in the 0.4–5 mTorr pressure range. The source has a discharge region of 3.6 cm in diameter and an excitation volume of 50 cm3. The plasma species diffuse out of the source into a larger materials processing region. The discharge is excited at a frequency of 2.45 GHz with input power levels of 50–90 watts. Measurements of the ion density, electron temperature, and absolute atomic hydrogen concentration are performed using Langmuir probes, OES (optical emission spectroscopy) and actinometry. Measurements are performed in both the source/excitation region and in the downstream processing region.; A global model for the discharges in this plasma source and a downstream charge particle diffusion model are also developed. The features of these plasma discharges determined by the combined measurements and models include a source region ion density in the 1011 cm −3range, which corresponds to an ionization ratio of 0.001 to 0.01. For the pure hydrogen discharges, the dominant ion species was H 2+. Also, it was found for the hydrogen discharge that the electron temperature was in the range 5–8 eV, the atomic hydrogen molar fraction was measured as 25–34% with an increasing fraction at higher pressures, and the surface recombination coefficient of atomic hydrogen was determined to be approximately 0.005. Argon and argon-hydrogen discharge mixtures were also modeled. The global model developed includes the effect of magnetic confinement/electron heating enhancement by the ECR magnets in the source. Extensive comparisons are made between the experimental measurements and the global model results.
机译：在典型的材料加工条件下，对用于材料加工的紧凑型ECR离子/自由基源进行了实验表征和建模。特别是，在紧凑的微波ECR（电子回旋共振）等离子体源中，在0.4-5 mTorr的压力范围内工作，产生并研究了氩，氢和氢氩放电。该源的放电区域直径为3.6 cm，激发体积为50 cm 3 。等离子体物质从源扩散到更大的材料处理区域。在2.45 GHz的频率下以50-90瓦的输入功率激发放电。离子密度，电子温度和绝对原子氢浓度的测量是使用Langmuir探针，OES（光发射光谱法）和光化法进行的。在源/激发区和下游处理区都进行测量。还开发了该等离子体源中放电的全局模型和下游电荷粒子扩散模型。通过组合的测量和模型确定的这些等离子体放电的特征包括源区离子密度在10 11 cm -3 范围内，对应于0.001的电离比。至0.01。对于纯氢放电，主要的离子种类是H 2 + 。另外，对于氢放电，发现电子温度在5–8 eV范围内，在较高压力下，原子氢摩尔分数测量为25–34％，并且分数随着增加而增加，并且原子氢的表面复合系数确定为大约0.005。还对氩气和氩气-氢气排放混合物进行了建模。开发的全局模型包括源中ECR磁体对磁限制/电子加热的影响。在实验测量结果和整体模型结果之间进行了广泛的比较。

著录项

  • 作者

    Tsai, Meng-Hua.;

  • 作者单位

    Michigan State University.;

  • 授予单位 Michigan State University.;
  • 学科 Engineering Electronics and Electrical.; Physics Fluid and Plasma.
  • 学位 Ph.D.
  • 年度 1999
  • 页码 173 p.
  • 总页数 173
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;等离子体物理学;
  • 关键词

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