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首页> 外文学位 >Combining nanoimprint lithography with dynamic templating for the fabrication of dense, large-area nanoparticle arrays.
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Combining nanoimprint lithography with dynamic templating for the fabrication of dense, large-area nanoparticle arrays.

机译：将纳米压印光刻技术与动态模板相结合，以制造致密的大面积纳米粒子阵列。

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摘要

The study of nanomaterials is a developing science with potentially large benefits in the development of catalysts, optical and chemical sensors, and solid state memory devices. As several of these devices require large arrays of nanoparticles, one of the greatest obstacles in material characterization and device development is the reliable manufacture of nanopatterns over a large surface area. In addition, various applications require different nanoparticle size and density. High density arrays with small nanoparticle sizes are difficult to achieve over a large surface area using current manufacturing processes. Herein, Nanoimprint Lithography (NIL) and Dynamic Templating are combined to create a new manufacturing process capable of developing high density arrays with small nanoparticle sizes. The NIL process involves the stamping of a polymer coated substrate by a silicon stamp with patterned nanofeatures. The stamp is then removed, leaving the pattern in the polymer, which is first etched and then coated with a thin layer of metal, filling the recessed regions of the pattern. The excess polymer is dissolved, leaving a pattern of nanoparticles on the substrate matching the pattern on the stamp. When Dynamic Templating is applied, a very thin layer of metal can be coated, which forms small nanoparticle sizes when dewetted. A custom NIL system has been developed to combine these two processes together, which has now proven to yield consistent large-area, dense arrays with a small nanoparticle size. An array spacing of 700 nm has been achieved, along with a nanoparticle size of 90 nm. Arrays have been created in gold and palladium, where there is now the potential to combine them with other solution-based syntheses which should lead to complex nanoparticle geometries suitable for sensor applications.
机译：纳米材料的研究是一门发展中的科学，在催化剂，光学和化学传感器以及固态存储设备的开发中具有潜在的巨大益处。由于这些装置中的一些装置需要大阵列的纳米颗粒，因此材料表征和装置开发中的最大障碍之一是在大表面积上可靠地制造纳米图案。另外，各种应用需要不同的纳米颗粒尺寸和密度。使用当前的制造工艺，难以在大表面积上实现具有小纳米颗粒尺寸的高密度阵列。此处，纳米压印光刻（NIL）和动态模板技术相结合，创造了一种新的制造工艺，能够开发出具有小纳米颗粒尺寸的高密度阵列。 NIL工艺涉及通过带有图案化纳米特征的硅压模对聚合物涂覆的基材进行压模。然后去除压模，将图案留在聚合物中，首先将其蚀刻，然后涂上一层金属薄层，以填充图案的凹陷区域。过量的聚合物溶解，在基板上留下纳米颗粒的图案与印模上的图案匹配。当应用动态模板技术时，可以涂覆非常薄的金属层，在润湿时会形成较小的纳米颗粒。已经开发了定制的NIL系统，将这两个过程结合在一起，现已证明可以产生一致的大面积，小纳米颗粒的密集阵列。已经实现了700 nm的阵列间距以及90 nm的纳米颗粒尺寸。已经在金和钯中创建了阵列，现在有可能将它们与其他基于溶液的合成相结合，这将导致适用于传感器应用的复杂纳米颗粒几何形状。

著录项

  • 作者

    Golze, Spencer D.;

  • 作者单位

    Temple University.;

  • 授予单位 Temple University.;
  • 学科 Nanoscience.;Mechanical engineering.;Materials science.
  • 学位 M.S.
  • 年度 2016
  • 页码 66 p.
  • 总页数 66
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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