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Self-organized nanoscale patterning under ion beam irradiation.

机译：在离子束辐照下的自组织纳米级图案。

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摘要

Energetic ion bombardment can lead to the development of complex and diverse nanostructures on or near the material surface. One of interests in these structures is the formation of highly ordered patterns whose optical, electronic and magnetic properties are different from bulk materials and might have important technological applications. In this work, the ordered pattern formation in a broad range of materials was fabricated and investigated, including one-dimension periodic arrays of nanoparticles and ripples, two-dimensional patterns of highly ordered Ga droplet on the surface of GaAs, ordered nanocrystals on argon ion sputtered polymer film, hexagonally ordered nanoholes on the surface of Ge, and three-dimensional void/bubble formation inside materials. In addition, angular and curvature dependence of sputtering yield was also discussed. Special emphasis was placed on the fundamental understanding of ordered pattern formation under irradiation. Sputtering, redeposition, viscous flow, and surface diffusion which are responsible for ordered pattern formation are investigated through a combination of modeling and in situ and ex-situ observations. It was proposed that a common feature of mechanism responsible for pattern formation during ion irradiation is the anisotropic movement of species. This anisotropy movement can take place either on the surface of materials driven by the off-normal angle ion bombardment, for example ripple and ordered droplet formation, or inside materials driven by crystalline structure, such as void/bubble lattice formation. Other mechanisms, such as redeposition, viscous flow and surface diffusion can enhance or weaken the tendency of the pattern formation and give rise to the change of initial patterns with a long time limit, such as ordered hole formation on Ge surface. It was suggested that dynamic balance between anisotropic mass loss and gain can lead to the formation of highly ordered Ga droplet on the ion irradiated GaAs surface. With computer modeling, it was found that nonlinear effects for long time limit determine the hexagonally ordered, honeycomb-like structure of nano-scale holes induced by the ion beam bombardment on the Ge surface.
机译：高能离子轰击可导致在材料表面上或附近形成复杂多样的纳米结构。这些结构的兴趣之一是形成高度有序的图案，这些图案的光学，电子和磁性性质不同于块状材料，并且可能具有重要的技术应用。在这项工作中，制造并研究了多种材料中的有序图案形成，包括纳米粒子和波纹的一维周期性阵列，GaAs表面上高度有序的Ga液滴的二维图案，氩离子上的有序纳米晶体溅射的聚合物薄膜，Ge表面的六角形有序纳米孔以及材料内部的三维空隙/气泡形成。另外，还讨论了溅射产率的角度和曲率依赖性。特别强调对辐射下有序图案形成的基本理解。溅射，再沉积，粘性流和表面扩散是有序图案形成的原因，是通过建模，原位和非原位观察相结合进行研究的。有人提出，在离子辐照过程中负责图形形成的机理的共同特征是物种的各向异性运动。这种各向异性运动既可以发生在非垂直角度离子轰击驱动的材料表面，例如波纹和有序的液滴形成，也可以发生在晶体结构驱动的材料内部，例如空隙/气泡晶格形成。其他机制，例如再沉积，粘性流动和表面扩散，可以增强或减弱图案形成的趋势，并在很长的时间限制内引起初始图案的变化，例如在Ge表面形成有序的孔。有人认为，各向异性质量损失与增益之间的动态平衡会导致在离子辐照的GaAs表面上形成高度有序的Ga液滴。通过计算机建模，发现长时间内的非线性效应决定了Ge表面上离子束轰击引起的纳米级孔的六角形有序蜂窝状结构。

著录项

  • 作者

    Wei, Qiangmin.;

  • 作者单位

    University of Michigan.;

  • 授予单位 University of Michigan.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 195 p.
  • 总页数 195
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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