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Development of distributed feedback dye lasers for generation of high-power 193 nm excimer laser short pulses.

机译：开发用于产生高功率193 nm准分子激光短脉冲的分布式反馈染料激光器。

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摘要

The combination of picosecond dye lasers, nonlinear mixing in crystals and excimer amplifiers offers an attractive way to generate intense diffraction-limited pulses throughout the ultraviolet region. However it is difficult to generate 193 nm seed pulses because this wavelength cannot be obtained by second harmonic generation method in any known crystals.; The thesis will describe a laser system which efficiently generates short, relatively stable high power 193 nm pulses. A new type of distributed feedback dye laser which has a grating on a thin substrate was also developed. It is reliable and easy to use. Two such DFDLs are used in the laser system to generate 10 ps pulses at two selected wavelengths of 266 nm and 706 nm that are frequency up-converted in a BBO crystal to generate nearly transform-limited 193 nm seed pulse about 10 ps in duration. The entire cascading dye laser system is pumped by a 350 mJ, 15 ns pulse at 308 nm generated by a XeCl excimer laser. The 193 nm seed pulse from BBO crystal is amplified in an ArF{dollar}sp*{dollar} excimer laser amplifier to 10 mJ in a nearly diffraction-limited beam. The system routinely produces 193 nm pulses of about 10 picosecond duration which can be focused to intensities of 10{dollar}sp{lcub}14{rcub}{dollar} W/cm{dollar}sp2{dollar}. One application of this system is investigation of the interaction of intense radiation fields with diatomic molecules.; A DFDL model which included non-sinusoidal profile of the modulated gain was developed. The model is used to study theoretically the fluctuation in pulse duration due to the pump variation and intrinsic fluctuation in spontaneous emission which leads the laser pulse.; A two-grating DFDL was also developed, tested experimentally and analyzed theoretically. It allows wavelength tuning and generation of shorter pulses. This type of system should be able to reach the subpicosecond regime with comparable pulse energies and beam divergences by using two-grating DFDL and thin BBO crystal.
机译：皮秒染料激光器，晶体中的非线性混合以及准分子放大器的组合提供了一种吸引人的方法，可以在整个紫外线区域产生强烈的衍射极限脉冲。但是，由于在任何已知的晶体中都不能通过二次谐波产生方法获得该波长，因此难以产生193nm的种子脉冲。本文将描述一种激光系统，该系统可以有效地产生较短的，相对稳定的高功率193 nm脉冲。还开发了一种新型的分布反馈染料激光器，该激光器在薄基板上具有光栅。它可靠且易于使用。在激光系统中使用了两个这样的DFDL，以在266 nm和706 nm的两个选定波长处产生10 ps脉冲，这些脉冲在BBO晶体中被频率上变频，以产生持续时间约为10 ps的几乎受变换限制的193 nm种子脉冲。整个级联染料激光系统由XeCl准分子激光在308 nm处产生的350 mJ，15 ns脉冲泵浦。来自BBO晶体的193 nm种子脉冲在ArF准分子激光放大器中在接近衍射极限的光束中放大到10 mJ。该系统通常会产生193 nm的脉冲，持续时间约为10皮秒，可以将其聚焦为10 {dollar} sp {lcub} 14 {rcub} {dollar} W / cm {dollar} sp2 {dollar}的强度。该系统的一种应用是研究强辐射场与双原子分子的相互作用。建立了包括非正弦分布的调制增益的DFDL模型。该模型用于从理论上研究由于泵浦变化和导致激光脉冲的自发发射的固有波动引起的脉冲持续时间的波动。还开发了两光栅DFDL，进行了实验测试和理论分析。它允许波长调谐和产生更短的脉冲。通过使用双光栅DFDL和薄BBO晶体，这种类型的系统应该能够以可比较的脉冲能量和光束发散达到亚皮秒级状态。

著录项

  • 作者

    Cui, Yifeng.;

  • 作者单位

    University of Maryland College Park.;

  • 授予单位 University of Maryland College Park.;
  • 学科 Physics Optics.
  • 学位 Ph.D.
  • 年度 1993
  • 页码 113 p.
  • 总页数 113
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学;
  • 关键词

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