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Development of extreme ultraviolet and soft x-ray multilayer optics for scientific studies with femtosecond/attosecond sources.

机译:开发用于飞秒/阿秒光源的科学研究用的极紫外和软X射线多层光学器件。

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摘要

The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses.;This thesis describes the design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig-Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy.;As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs described in this thesis can be extended to higher photon energies, and such designs can be used with those sources to enable new scientific studies, such as molecular bonding, phonon, and spin dynamics.
机译:用于极紫外(EUV)辐射的多层光学器件的发展已导致许多科学和技术领域的进步,包括材料研究,EUV光刻,水窗显微镜,等离子成像和轨道太阳物理成像。飞秒和亚秒级EUV脉冲从高谐波生成激光器等光源产生的最新进展,再加上EUV辐射提供的元素和化学特异性,为研究材料中的基本动态过程提供了新的机会。这些努力的关键是多层光学器件的设计和制造,以传输,聚焦,成形和成像这些超快脉冲。本论文描述了用于EUV飞秒和阿秒科学研究的多层光学器件的设计,制造,表征和应用。描述了用于带宽控制,脉冲整形和压缩的多层镜,三材料多层以及用于偏振控制的多层。对多层光学器件进行了表征,包括材料光学常数的测量,多层反射镜的反射率以及多层反射相的计量学,这对于保持脉冲大小和形状至关重要。本文详细介绍了这些多层反射镜的两种应用。在第一个应用中,宽带多层被用来表征和测量来自高谐波产生源的100亚秒以下的脉冲,并且是与德国马克斯·普朗克量子光学研究所和德国加奇的路德维希·马克西米利安斯大学合作完成的。 Krausz和Kleineberg教授。在第二个应用中,带有偏振控制的多层反射镜可用于与意大利的里雅斯特Elettra的Parmigiani教授的T-REX小组持续合作研究飞秒自旋动力学。例如,随着新的超快x射线源的出现,在自由电子激光器中,本文描述的多层设计可以扩展到更高的光子能量,并且此类设计可以与这些源一起使用,以实现新的科学研究,例如分子键合,声子和自旋动力学。

著录项

  • 作者

    Aquila, Andrew Lee.;

  • 作者单位

    University of California, Berkeley.;

  • 授予单位 University of California, Berkeley.;
  • 学科 Physics Electricity and Magnetism.;Engineering Materials Science.;Physics Optics.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 136 p.
  • 总页数 136
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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