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Effect of different finishing and polishing techniques on the surface roughness of four ceramic materials after surface adjustment.

机译：表面调整后，不同的精加工和抛光技术对四种陶瓷材料的表面粗糙度的影响。

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摘要

Purpose: To measure and compare the surface roughness of glazed and polished monolithic ceramic materials with the surface roughness produced by different intraoral polishing systems on adjusted monolithic ceramic materials. Materials and Methods: Milled ceramic disks (10mm diameter x 2mm thickness) were manufactured and distributed according to the following groups (n=10): BruxZir (glazed and polished), Zenostar (glazed and polished), IPS Empress and IPS e.max. Surface roughness, expressed as Ra and RMS values, was measured using AFM and profilometer before and after adjustment and polishing with the following intraoral polishing systems: BruxZir and Dialite ZR (for BruxZir), Zenostar and Dialite ZR (for Zenostar), and OptraFine and Dialite LD for IPS Empress and IPS e.max Mean and standard error for each material and polishing system were calculated. Data were analyzed with T-test, one-way ANOVA, and Bonferroni post hoc tests. Results: In general, all materials presented a smoother surface at baseline than after adjustment and polishing. The AFM results showed that baseline values were not significantly different among the groups. Significantly lower Ra and RMS values (p<0.05) were obtained when BruxZir Polished was polished with Dialite ZR when compared to BruxZir System and IPS e.max specimens were adjusted and polished with OptraFine System in comparison to Dialite LD System. Statistically significant difference was found in Zenostar Glazed and IPS Empress groups (p<0.005) and lower Ra and RMS values were found using the Zenostar polishing system in Zenostar glazed respectively.;The profilometer results showed that the Ra and RMS baseline values of BruxZir polished and Zenostar polished were significantly lower than all other materials. After adjustment and polishing, BruxZir polished and BruxZir glazed specimens presented significant difference (p<0,005) and lower RA and RMS values when Dialite Zr was used compared to BruxZir. Conclusions: BruxZir zirconia resulted in a smoother surface with Dialite ZR polishing system compared to BruxZir polishing system, Zenostar zirconia produced a smoother surface with Zenostar polishing system compared to Dialite ZR polishing system and IPS Empress CAD and IPS e.max CAD presented a smoother surface with OptraFine polishing system in comparison to Dialite LD polishing system. The AFM complements the Profilometer information and should be recommended in surface roughness studies in dental ceramics.
机译：目的：测量和比较釉面和抛光的整体陶瓷材料的表面粗糙度，以及通过不同的口腔内抛光系统在调整后的整体陶瓷材料上产生的表面粗糙度。材料和方法：根据以下组（n = 10）制造并分配研磨的陶瓷盘（直径10mm x厚度2mm）：BruxZir（上釉和抛光），Zenostar（上釉和抛光），IPS Empress和IPS e.max 。在使用以下口腔内抛光系统进行调节和抛光之前和之后，使用AFM和轮廓仪测量表面粗糙度，以Ra和RMS值表示：BruxZir和Dialite ZR（用于BruxZir），Zenostar和Dialite ZR（用于Zenostar）以及OptraFine和IPS Empress和IPS e.max的Dialite LD计算了每种材料和抛光系统的均值和标准误差。使用T检验，单向方差分析和Bonferroni事后检验分析数据。结果：通常，所有材料在基线时的表面都比调整和抛光后的表面光滑。 AFM结果显示，基线值在各组之间无显着差异。与BruxZir系统相比，当用Dialite ZR抛光BruxZir抛光剂和IPS e.max样品时，与Dialite LD系统相比，用OptraFine系统调节和抛光时，获得的Ra和RMS值明显较低（p <0.05）。 Zenostar Glazed和IPS Empress组之间存在统计学差异（p <0.005），而Zenostar抛光系统分别使用较低的Ra和RMS值;轮廓仪结果显示BruxZir抛光的Ra和RMS基线值和Zenostar抛光后的材料明显低于所有其他材料。经过调整和抛光后，与DialxZir相比，使用Dialite Zr时，BruxZir抛光和BruxZir釉面样品表现出显着差异（p <0.005），并且RA和RMS值更低。结论：与BruxZir抛光系统相比，使用Dialite ZR抛光系统生产的BruxZir氧化锆表面更光滑;与Dialial ZR抛光系统相比，Zenostar氧化锆的Zenostar抛光系统产生的表面更光滑; IPS Empress CAD和IPS e.max CAD的表面更光滑与Dialite LD抛光系统相比，使用OptraFine抛光系统。 AFM补充了轮廓仪信息，应在牙科陶瓷的表面粗糙度研究中推荐使用。

著录项

  • 作者

    Amaya-Pajares, Silvia P.;

  • 作者单位

    The University of North Carolina at Chapel Hill.;

  • 授予单位 The University of North Carolina at Chapel Hill.;
  • 学科 Dentistry.;Information science.
  • 学位 M.S.
  • 年度 2014
  • 页码 70 p.
  • 总页数 70
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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