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Preparation and Detailed X-Ray Photoelectron Spectroscopy and Spectroscopic Ellipsometry Analysis of Ultrathin Protective Coatings

机译：超薄保护涂层的制备及X射线光电子能谱和光谱椭圆形分析

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作者
Johnson, Brian Ivins.;
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作者单位

Brigham Young University.;

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授予单位 Brigham Young University.;
学科
学位 Ph.D.
年度 2019
页码 244 p.
总页数 244
原文格式 PDF
正文语种 eng
中图分类 AAI27545139;
关键词
Aluminum oxide; Perfluorocarbons; Real time analysis; Spectroscopic Ellipsometry; Thin films; X-ray photoelectron Spectroscopy;

机译：氧化铝;全氟化物;实时分析;光谱椭圆形测定法;薄膜;X射线光电子能谱;

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机译：红外光谱椭偏仪（IRSE）和X射线光电子能谱仪（XPS）监控马来酰亚胺官能化表面的制备：从金到硅（111）
2. Determination of the Thickness of Ultrathin Coatings by X-ray Photoelectron Spectroscopy with Elastic Scattering of Photoelectrons Taken into Account [J] . V.I. Nefedov, I.S. Nefedova, I. Ulig Inorganic Materials . 1998,第11期

机译：考虑到电子的弹性散射的X射线光电子能谱法测定超薄涂层的厚度
3. Investigation of HfO 2 Thin Films on Si by X-ray Photoelectron Spectroscopy, Rutherford Backscattering, Grazing Incidence X-ray Diffraction and Variable Angle Spectroscopic Ellipsometry [J] . Xuguang Luo, Yao Li, Hong Yang, Crystals . 2018,第6期

机译：X射线光电子谱对Si的HFO 2薄膜研究，Rutherford反向散射，放牧入射X射线衍射和可变角度光谱椭圆形测定法
4. Using ellipsometry and x-ray photoelectron spectroscopy for real-time monitoring of the oxidation of aluminum mirrors protected by ultrathin MgF_2 layers [C] . Brian I. Johnson, Tahereh G. Avval, Grant T. Hodges, Astronomical Optics: Design, Manufacture, and Test of Space and Ground Systems . 2019

机译：使用椭圆形和X射线光电子能谱进行实时监测超薄MGF_2层保护的铝镜氧化
5. Studies of the structural and electrical properties of the oxide/silicon interface via angle-resolved x-ray photoelectron spectroscopy, null ellipsometry, and capacitance-voltage measurements [D] . Jackson, Michael A. 1992

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6. Effects of Varied Cleaning Methods on Ni-5 W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study [O] . Vyshnavi Narayanan, Els Bruneel, Ruben Hühne, 2012

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7. New Data Analysis Tools for X-ray Photoelectron Spectroscopy (XPS) and Spectroscopic Ellipsometry (SE): Uniqueness Plots and Width Functions in XPS, and Distance, Principal Component, and Cluster Analyses in SE [O] . Matthew R. Linford, Bhupinder Singh, Daniel Velázquez, 2016

机译：用于X射线光电子能谱（XPS）和光谱椭圆形测量（SE）的新数据分析工具：XPS中的唯一性图和宽度函数，以及SE中的距离，主成分和簇分析
8. Spectroscopic Ellipsometry and X-ray Photoelectron Spectroscopy Studies of the Annealing Behavior of Amorphous Si Produced by Si Ion Implantation [R] . Vasquez, R. P., Madhukar, A., Tanguay, A. R. 1985

机译：光谱椭偏仪和X射线光电子能谱研究si离子注入生成的非晶硅的退火行为

Preparation and Detailed X-Ray Photoelectron Spectroscopy and Spectroscopic Ellipsometry Analysis of Ultrathin Protective Coatings

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