利用直流磁控反应溅射技术,通过调节反应气压(RP),在250℃衬底温度下制备了一系列氧化银(AgxO)薄膜,并利用X射线衍射谱、能量色散谱和分光光度计重点研究了RP对AgxO薄膜的结构和光学性质的影响.研究结果表明,随着RP从0.5 Pa升高到3.5 Pa,薄膜明显呈现了从两相(AgO+Ag2O)到单相(Ag2O)结构再到两相(Ag2O+AgO)结构的演变.特别是在RP=2.5 Pa时成功制备了单相Ag2O薄膜,使AgxO薄膜的热分解临界温度的有效降低成为现实.AgxO薄膜透明区的透射率随RP的增加而增加,而反射率和吸收率随RP的增加而减小.该结果可归结于薄膜相结构的演变和薄膜厚度的减小.两相(AgO+Ag2O)薄膜的吸收边在2.75 eV附近,而单相(Ag2O)和Ag2O相占主导的两相(Ag2O+AgO)薄膜的吸收边在2.5 eV附近.%Using direct-current reactive magnetron sputtering technique, a series of silver oxide ( Agx O) films were deposited at a substrate temperature of 250 ℃ by modifying the reactive pressure (RP). Effect of the RP on the film structure and optical properties was investigated by X-ray diffractometry, energy dispersive spectroscopy and spectrophotometry. An evolution of the phase structure from biphased (AgO + Ag2O) to single-phased (Ag2O), and then to biphased (Ag2O +AgO) occurred with the RP increasing from 0. 5 to 3.5 Pa for the Agx O films. Single-phase Ag2O film, specially, was deposited at RP = 2.5 Pa, which was capable of lowering the threshold of thermal decomposition temperature of the AgXO film. The film transmissivity in transparent region increased with the RP increasing, while the film reflectivity and absorptivity decreased with the RP increasing. This result is attributed to the evolution of the phase structure and the decrease of the film thickness. The absorption edge of the biphased ( AgO + Ag2O) Agx O film was located near 2. 75 eV,whereas the absorption edge of the single-phase (Ag2O) and Ag2O-dominated biphased (Ag2O + AgO) Agx O film was located near 2. 5 eV.
展开▼
