基于咖啡环理论，利用微米尺度限制下的弯液面溶剂散逸过程获得表面微结构可控的有序阵列，以此为母模板制备聚二甲基硅氧烷(PDMS)弹性印章，通过复制模塑过程实现阵列结构转移。利用广义 Young-Laplace 方程建立的理论模型分析弯液面聚合物沉积黏连过程，推导出条纹沉积频率与聚合物分子量、基底滑动速率和溶液浓度的关系，理论计算结果与实验现象一致。%Replica molding technology has a reproducible and high-resolution advantage in fabrication of polymer patterns with the feature sizes of sub-micrometer to micrometer. It is critically desirable to develop a low cost and rapid route for building the initialtemplate. In this report, ordered array which could achieve morphological control was continuously supplied from solvent evaporation-driven process in a micron spacing gap by the coffee-stain theory. We use the patterned array as a mother setof the pattern definition of the soft moldpolydimethylsiloxane(PDMS) and obtain transferred patterns through replica molding technology. We also explore the polymer deposition periodically based on the theoretical model of Young-Laplace equation. The results demonstrate that the deposition frequency is influened by molecular weight of polymer, sliding speed of glass plate and concentration of solution. Trends predicted by these calculations agree with experimental behavior.
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