纳米材料具有独特的物理化学性质,在纳米电子器件和生物传感等方面显示了巨大的应用潜力.基于二维纳米材料的器件,需要利用金属电极来构建传感器或者场效应晶体管结构.目前,已有一些方法来制备金属电极,如光刻、聚焦离子束及纳米压印等方法,但是这些方法通常需要昂贵的设备,并且操作非常复杂.提出采用基于光诱导的金属纳米电极沉积方法,通过对多个实验参数(包括输入交流电信号的频率、幅值、溶液浓度以及氢化非晶硅层厚度)的分析,得到了优化的金属电极沉积条件.在此基础上,利用光学显微镜、原子力显微镜和扫描电子显微镜对制备的金属电极进行了表征.%Nanomaterials have unique physical and chemical properties,which have shown great potential in nano-electronic devices and nano-biosensors. Based on the two-dimensional nano-material devices,it is necessary to use the metal electrodes to create nano-sensors or field-effect transistor structures. At present,there are several methods to fabricate the metal electrodes such as lithography, focused ion beam ( FIB ) and nanoprinting. However, these methods often require the expensive equipments and are very complicated to operate. We propose a method of for the deposition of micro-electrodes,based on optically-induced metal electrodeposition. By analyzing the experimental parameters ( including the frequency, amplitude, solution concentration and thickness of hydrogenated amorphous silicon layer) ,the optimized deposition conditions of the micro-electrodes were obtained. Then,the prepared micro-electrodes were characterized by the optical microscope, atomic force microscope ( AFM ) and scanning electron microscope( SEM) .
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