SBA-15(mesoporous SiO_2) is used to stabilize and transfer F-in the NH_4BF_4 CVD reaction for the first time, and a large-scale crystalline h-BN phase can be prepared. We successfully fabricate hollow h-BN capsules with collapsed surfaces in our designed NH_4BF_4 CVD system. Optimum temperature conditions are obtained, and a detailed formation mechanism is further proposed. The successful SBA-15-assisted NH_4BF_4 CVD route is of importance and enriches the engineering technology in the h-BN single-source CVD reaction.
展开▼
机译：ChemInform Abstract: Chemical Vapor Deposition Precursor Chemistry. Part 2. Formation of Pure Aluminum, Alumina, and Aluminum Boride Thin Films from Boron‐ Containing Precursor Compounds by Chemical Vapor Deposition.
机译：Massachusetts Institute of Technology Reports Findings in Chemical Vapor Deposition (Revealing Variable Dependences in Hexagonal Boron Nitride Synthesis via Machine Learning)
