首页> 中文期刊> 《中国物理快报:英文版》 >A Ferroelectric Domain-Wall Transistor

A Ferroelectric Domain-Wall Transistor

         

摘要

On the basis of novel properties of ferroelectric conducting domain walls,the domain wall nanoelectronics emerges and provides a brand-new dimension for the development of high-density,high-speed and energy-efficient nanodevices.For in-memory computing,three-terminal devices with both logic and memory functions such as transistors purely based on ferroelectric domain walls are urgently required.Here,a prototype ferroelectric domain-wall transistor with a well-designed coplanar electrode geometry is demonstrated on epitaxial Bi Fe O_(3)thin films.For the logic function,the current switching between on/off states of the transistor depends on the creation or elimination of conducting domain walls between drain and source electrodes.For the data storage,the transistor can maintain nonvolatile on/off states after the write/erase operations,providing an innovative approach for the development of the domain wall nanoelectronics.

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