首页> 中文期刊> 《中国物理快报:英文版》 >Growth and Photoluminescence of Epitaxial CeO_(2) Film on Si (111) Substrate

Growth and Photoluminescence of Epitaxial CeO_(2) Film on Si (111) Substrate

         

摘要

CeO_(2) film with a thickness of about 80 nm was deposited by a mass-analyzed low-energy dual ion beams deposition technique on Si(111)substrate.Reflection high-energy electron diffraction and x-ray diffraction measurements showed that the film is a single crystal.The tetravalent state of Ce in the film was confirmed by x-ray photoelectron spectroscopy measurement,indicating that stoichiometric CeO_(2) was formed.Violet/blue light emission(379.5 nm)was observed at room temperature,which may be tentatively explained by charge transitions from the 4f band to the valence band of CeO_(2).

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