首页> 中文期刊> 《中国物理快报:英文版》 >Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

         

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  • 来源
    《中国物理快报:英文版》 |2014年第8期|160-162|共3页
  • 作者单位

    Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic information, Huazhong University of Science and Technology, Wuhan 430074;

    Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic information, Huazhong University of Science and Technology, Wuhan 430074;

    Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic information, Huazhong University of Science and Technology, Wuhan 430074;

    State Key Laboratory of Optical Communication Technologies and Networks,Wuhan Research Institute of Posts and Telecommunications, Wuhan 430074;

    Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic information, Huazhong University of Science and Technology, Wuhan 430074;

    Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic information, Huazhong University of Science and Technology, Wuhan 430074;

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  • 正文语种 eng
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