Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System

HUNDUR Yakup; G(U)VEN(C) Ziya B; HIPPLER Rainer

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Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System

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The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations.The Ni(100) slab is mimicked by an embedded-atom potential,and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential.Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy.Sputtering yield,angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated,and compared to the available theoretical and experimental data.

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《中国物理快报：英文版》 |2008年第2期|730-733|共4页
作者
HUNDUR Yakup; G(U)VEN(C) Ziya B; HIPPLER Rainer;
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作者单位

Department of Physics,Istanbul Technical University,Istanbul,TR-34469,Turkey;

Electronic and Communication Engineering,(C)ankaya University,Balgat,Ankara,TR-06530,Turkey;

lnstitut für Physik,Ernst-Moritz-Arndt Universit(a)te Greifswald,Greifswald,D-17489,Germany;

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中图分类物理学;
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Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System

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