Formation for Bass-Relief Microprofiles Based on an Analytic Formulation

SHI Li-Fang; DONG Xiao-Chun; DENG Qi-Ling; LUO Xian-Gang; DU Chun-Lei

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Formation for Bass-Relief Microprofiles Based on an Analytic Formulation

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摘要

A method of fast design and fabrication for bass-relief micro-profiles is developed by using an analytic formulation to determine the exposure distribution. Based on an equivalent exposure threshold model, the formulation is simplified for the case of bass-relief profile corresponding to the smaller exposure dose. The mask function for a microlens array is designed without iteration involved by the analytic formulation. The experiment is performed to validate the method, and the fabrication result is obtained with the profile error less than 30 nm (rms).

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《中国物理快报：英文版》 |2007年第10期|2867-2869|共3页
作者
SHI Li-Fang; DONG Xiao-Chun; DENG Qi-Ling; LUO Xian-Gang; DU Chun-Lei;
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State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209;

State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209;

State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209;

State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209;

State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209;

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中图分类物理学;
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Formation for Bass-Relief Microprofiles Based on an Analytic Formulation

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