Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources

WANG Kai-Ge; WANG Lei; LIU Wen-Qing; NIU Han-Ben

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Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources

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@@ The construct and electrode potential of emitting systems are very important for the portable ultrahigh brightness microfocus x-ray sources. The ratio of Dw/H (Dw is the diameter of Wehnelt grid aperture and H is the setting height of the cathode) and the grid bias are determinative parameters for the emission current and focus properties of an electron beam.

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《中国物理快报：英文版》 |2006年第9期|2368-2371|共4页
作者
WANG Kai-Ge; WANG Lei; LIU Wen-Qing; NIU Han-Ben;
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作者单位

Institute of Optoelectronics, Shenzhen University, Shenzhen 518060;

Anhui Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Hefei 230031;

Xi'an Institute of Applied Optics, Xi'an 710065;

Anhui Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Hefei 230031;

Institute of Optoelectronics, Shenzhen University, Shenzhen 518060;

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正文语种 chi
中图分类物理学;
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Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources

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