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Fabrication of GaN Nanorods in a Large Scale on Si(111) Substrate by Ammoniating Technique

机译:通过氨化技术在Si(111)衬底上大规模制备GaN纳米棒

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@@ GaN nanorods in a large scale have been synthesized on Si (111) substrates by ammoniating Ga2Os/Mg films under flowing ammonia atmosphere at the temperature of 1000℃ for 15 min. The as-synthesized GaN nanorods are characterized by scanning electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, and highresolution transmission electron microscopy. The results demonstrate that these straight nanorods are hexagonal wurtzite GaN single crystals in diameters ranging from 200 nm to 600 nm.
机译:通过在流动的氨气气氛中,在1000℃的温度下氨化Ga2Os / Mg膜,在Si(111)衬底上大规模合成了GaN纳米棒。所合成的GaN纳米棒的特征在于扫描电子显微镜,x射线衍射,x射线光电子能谱和高分辨率透射电子显微镜。结果表明,这些直的纳米棒是直径为200 nm至600 nm的六方纤锌矿GaN单晶。

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