Fabrication and Characterization of Nanocrystalline VO2 Thin Films

WANG Hong-Chen; YI Xin-Jian; LAI Jian-Jun; LI Yi

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Fabrication and Characterization of Nanocrystalline VO2 Thin Films

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@@ Nanocrystalline VO2 films with phase transition temperature 34℃ have been fabricated on Si3N4-film-coated silicon and quartz substrates by argon-annealing films of metastable VO2(B). The original VO2(B) films are obtained by ion beam sputtering in an argon-oxygen atmosphere at 200 ℃. The nanocrystalline VO2 films exhibit strong changes in electrical and optical properties when a phase transition is completed. The phase transition temperature in the as-fabricated samples is about 34 ℃, which is smaller in comparison with 68 ℃ in the singlecrystalline VO2 material. A lower phase transition temperature is favorable for device applications such as smart window coating and low power consumption optical switching.

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《中国物理快报：英文版》 |2005年第7期|1746-1748|共3页
作者
WANG Hong-Chen; YI Xin-Jian; LAI Jian-Jun; LI Yi;
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Department of Optoelectronic Engineer, Huazhong University of Science and Technology, Wuhan 430074;

The National Laboratory for Optoelectronics, 1037 Loyu Road, Wuhan 430074;

Department of Optoelectronic Engineer, Huazhong University of Science and Technology, Wuhan 430074;

The Key Laboratory of Education Ministry for Imaging Recognition and Intelligence Control, Huazhong University of Science and Technology, Wuhan 430074;

Department of Optoelectronic Engineer, Huazhong University of Science and Technology, Wuhan 430074;

Department of Optoelectronic Engineer, Huazhong University of Science and Technology, Wuhan 430074;

The National Laboratory for Optoelectronics, 1037 Loyu Road, Wuhan 430074;

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正文语种 chi
中图分类物理学;
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Fabrication and Characterization of Nanocrystalline VO2 Thin Films

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